Inventor
Choong-Ryul Ryou
Inventor
Suwon-si, KR
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Dprimary
H10DInorganic electric semiconductor devices30%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1020%
H01LSemiconductor devices10%
B82YSpecific uses or applications of nanostructures5%
G08GTraffic control systems5%
H02HEmergency protective circuit arrangements5%
PatentTitleYear
9,111,880'Method of forming a pattern in a semiconductor device and method of forming a gate using the same'20158,846,304'Method of forming a pattern in a semiconductor device and method of forming a gate using the same'20148,409,787'Method of forming a pattern in a semiconductor device and method of forming a gate using the same'20137,914,973'Method of forming a pattern in a semiconductor device and method of forming a gate using the same'20117,179,714'Method of fabricating MOS transistor having fully silicided gate'20077,045,429'Method of manufacturing a semiconductor device'2006Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2006–2015Patents assigned to SAMSUNG ELECTRONICS CO LTD (6)· patent assignee history
2006–2015Based in Suwon-si, KR· patent location history
2013Patents assigned to KANG HEE-SUNG (1)· patent assignee history
2013Patents assigned to RYOU CHOONG-RYUL (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SAMSUNG ELECTRONICS CO LTD | 6 | 2006–2015 |
| KANG HEE-SUNG | 1 | 2013 |
| RYOU CHOONG-RYULself | 1 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Suwon-si, KR | 6 | 2006–2015 |