Inventor
Isao Hamaguchi
Inventor
Futtsu, JP
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1030%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests20%
PatentTitleYear
7,204,887'Wafer holding, wafer support member, wafer boat and heat treatment furnace'20077,084,459'SOI substrate'20066,617,034'SOI substrate and method for production thereof'20035,918,151'Method of manufacturing a semiconductor substrate and an apparatus for manufacturing the same'19995,534,446'Process for producing buried insulator layer in semiconductor substrate'1996Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1996–2007Patents assigned to NIPPON STEEL CORP (5)· patent assignee history
1996Based in Kawasaki, JP· patent location history
1999Based in Hikari, JP· patent location history
2003–2007Based in Futtsu, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NIPPON STEEL CORP | 5 | 1996–2007 |
Locations
| Location | Patents | Span |
|---|---|---|
| Futtsu, JP | 3 | 2003–2007 |
| Hikari, JP | 1 | 1999 |
| Kawasaki, JP | 1 | 1996 |