Inventor

Yutaka Nakahara

Inventor
Iwatsuki, JP

Overview

68→
Patents
1978–2010
Patent span
Chemistry
Primary field (CPC C)

Patents· 68 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C08Kprimary
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients40%
C07DHeterocyclic compounds21%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium9%
C08LCompositions of macromolecular compounds9%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds5%
C07CAcyclic or carbocyclic compounds5%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds4%
B29CShaping or joining of plastics1%
B29KIndexing scheme associated with subclasses b29b, b29c or b29d, relating to moulding materials or to materials for moulds, reinforcements, fillers or preformed parts, e.g. inserts1%
C08JWorking-up1%
PatentTitleYear
7,651,473'Extracorporeal blood circulating apparatus, closed-type venous reservoir and extracorporeal blood circulating method'20105,607,988'Stabilized polymeric material composition'19975,455,347'Piperidine compounds'19954,997,888'Weatherability and adherence of polypropylene'19914,994,529'Weatherability and adherence of polypropylene'19914,910,238'Poly(2,2,6,6-tetramethyl piperidyl amino)-1,3,5-triazines as stabilizers for synthetic polymer compositions'19904,898,688'Poly(2,2,6-tetramethyl piperidyl amino)-1,3,5-triazines as stabilizers for synthetic polymer compositions'19904,897,438'Stabilized synthetic resin composition'19904,885,323'Poly-2,2,6,6-tetramethyl piperidyl amino spiro glycol ether-1,3,5-triazines'19894,871,793'Polyphenylene sulfide resin compositions having improved resistance to deterioration when exposed to light and containing alkylidene bis (benzotriazolylphenols)'19894,820,844'Radiation sensitizer'19894,812,498'Polycarbonate resin compositions having improved resistance to deterioration when exposed to light and containing alkylidene bis(benzotriazolyl phenols)'19894,798,836'Bis-(2,2,6,6-tetramethyl-piperidyl) diimides as light stabilizers for synthetic polymers'19894,767,834'Vinyl benzyl 2,2,6,6-tetramethyl piperidines'19884,759,871'Hydrocarbyl(polyphenol)-poly(2,2,6,6-tetramethyl piperidyl-1,3,5-triazines) as stabilizers for synthetic polymer compositions'19884,760,141'Hydrocarbyl(polyphenol)-poly(2,2,6,6-tetramethyl piperidyl-1,3,5-triazines) as stabilizers for synthetic polymer compositions'19884,743,688'Poly-2,2,6,6-tetramethyl piperidyl amino spiro glycol ether-1,3,5-triazines'19884,740,544'Hydrocarbyl(polyphenol)-poly(2,2,6,6-tetramethyl piperidyl-1,3,5-triazines) as stabilizers for synthetic polymer compositions'19884,698,381'N,N\',N\"-tris((2,2,6,6-tetramethyl-4-piperidyl)triazinyl) undecane triamines as stabilizers for synthetic polymers'19874,692,485'Vinyl benzyl 2,2,6,6-tetramethyl piperidines'19874,673,701'Alkylidene bisphenol phosphites and phosphates having 2,2,6,6-tetramethyl piperidinyl groups and synthetic resin composition'19874,670,492'Cyclic bis and tris phosphites and stabilized synthetic resin compositions'19874,623,685'Thermosetting synthetic resin lacquer compositions of improved light stability'19864,540,728'Diallyl-1,3,5-triazino-4-(2,2,6,6-tetramethyl piperidyl) amines as monomers and polymers and stabilized synthetic resin compositions'19854,529,760'Oligomers of 2,2,6,6-tetramethylpiperidinol polycarboxylic acid esters and synthetic polymer compositions'19854,491,643'Bis(2,2,6,6-tetramethylpiperidyl-1,3,5-triazinyl)-spirodiamines and spiroglycol ethers and synthetic resin compositions containing the same'19854,487,887'Diallyl amino-4-(2,2,6,6-tetramethyl piperidyl) carboxylic acid esters and amides as monomers and polymers and stabilized synthetic resin compositions'19844,487,900'Diallyl 4-(2,2,6,6-tetramethyl piperidyl) amines as monomers and polymers and stabilized synthetic resin compositions'19844,481,317'Hindered bisphenol diphosphonites and stabilized synthetic resin compositions containing the same'19844,477,616'Tetra-(2,2,6,6- tetramethyl-4-piperidinyl)-3-methyl-5-(1\'2\'-biscarboxylate)-ethyl-cyclohe xane or 3-cyclohexene-1,2-dicarboxylates and synthetic resin compositions containing the same'19844,468,488'Poly(piperidylamine) alkanes and synthetic resin compositions stabilized thereby'19844,463,113'Bis-phenol phosphates as clarifiers for polyolefin resins'19844,463,112'Phenylethylidene-substituted phenyl polyphosphites'19844,418,196'Process for preparing triacetone amine'19834,415,689'Synthetic resin compositions containing 2,2,6,6-tetramethyl piperidinyl triazines'19834,415,688'Poly(piperidylamine) alkanes and synthetic resin compositions stabilized thereby'19834,405,736'2,2,6,6-Tetramethyl-4-piperidyl spiro aliphatic ethers and stabilizers for synthetic polymers'19834,371,647'2,6-Di-tertiary butyl phenyl pentaerythritol spiro bis-phosphites enhancing the stability to heat and light of synthetic resin'19834,371,646'2,6-Di-tertiary butyl phenyl phosphites and synthetic resin compositions having enhanced stability to heat and light'19834,362,830'Hindered bis-phenol phenyl phosphites and synthetic resin compositions having enhanced stability to heat and light'19824,349,468'Stabilizer for polyolefin resin'19824,348,308'Ortho-substituted aryl phosphite additive composition'19824,346,025'Stabilized vinyl chloride polymer comprising a phenylethylidene aryl phosphite'19824,336,183'2,2,6,6-Tetramethyl-4-piperidyl carboxylic acid esters and amides of mono and poly alcohols, phenols and amines as stabilizers for synthetic polymers'19824,321,191'Stabilized composition comprising a dihydric alcohol thiodipropionic acid ester'19824,309,335'Polyphenylene oxide resin composition stabilizer'19824,298,520'Phenolic ester synthetic resin stabilizers'19814,293,472'Stabilized synthetic resin composition'19814,282,141'Ortho-substituted phenyl phosphite additive composition'19814,257,927'Inorganic organic coester stabilizers'19814,255,301'Glycol carbonate ester stabilizers for synthetic resins'19814,252,958'Process for preparing 2,2,6,6-Tetramethyl-4-oxopiperidine'19814,250,313'Process for preparing 4-piperidone spiroketal compounds'19814,250,312'Process for preparing 4-piperidone spiroketal compounds'19814,239,803'Ethylene polymer composition'19804,233,414'Polyhydric phenol coester stabilizers'19804,226,991'Process for preparing 3-alkylthiopropionic acid esters'19804,225,474'Organophosphonate coester stabilizers'19804,222,931'Stabilizers for synthetic polymers comprising 2,2,6,6-tetramethyl-4-piperidyl ether alcohol or ether, phosphonic acid ester and phenolic antioxidant'19804,210,577'Stabilizers for synthetic polymers comprising 2,2,6,6-tetramethyl-4-piperidyl carboxylic acid ester, phosphonic acid ester and phenol'19804,199,495'Thiolcarbonate ester stabilizers'19804,174,297'Polyhydric phenol coester stabilizers'19794,171,298'Phenolic ester synthetic resin stabilizers'19794,146,517'Inorganic and organic acid coester stabilizers'19794,145,333'Stabilized synthetic resin composition'19794,107,136'Synthetic resin stabilizer comprising an organic phosphite and a carbonate'19784,105,629'Synthetic resin stabilizer comprising a thioether ester and hindered phenolic carbonate'19784,104,217'Carbonate ester stabilizers for polymers'1978

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1978–1982Patents assigned to ARGUS CHEM (22)· patent assignee history
1978–1989Based in Iwatsuki, JP· patent location history
1981–1989Patents assigned to NAKAHARA YUTAKA (5)· patent assignee history
1981Based in Iwatsuiki, JP· patent location history
1982–1991Patents assigned to ADEKA ARGUS CHEMICAL CO LTD (37)· patent assignee history
1982–1984Patents assigned to AKUTSU MITSUO (2)· patent assignee history
1986–1991Based in Okegawa, JP· patent location history
1995–1997Patents assigned to ASAHI DENKA KOGYO KK (2)· patent assignee history
1995–1997Based in Saitama, JP· patent location history
2010Based in Hiroshima, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ADEKA ARGUS CHEMICAL CO LTD371982–1991
ARGUS CHEM221978–1982
NAKAHARA YUTAKAself51981–1989
AKUTSU MITSUO21982–1984
ASAHI DENKA KOGYO KK21995–1997
Locations
LocationPatentsSpan
Iwatsuki, JP471978–1989
Okegawa, JP171986–1991
Saitama, JP21995–1997
Hiroshima, JP12010
Iwatsuiki, JP11981