Inventor

Youichi Ando

Inventor
Tokyo, JP

Overview

4→
Patents
2013–2021
Patent span
Chemistry
Primary field (CPC C)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G11Bprimary
G11BInformation storage based on relative movement between record carrier and transducer23%
Y10TTechnical subjects covered by former us classification15%
B05DProcesses for applying fluent materials to surfaces, in general8%
B29CShaping or joining of plastics8%
B33YAdditive manufacturing, i.e. manufacturing of three-dimensional [3d] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3d printing, stereolithography or selective laser sintering8%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds8%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients8%
C08LCompositions of macromolecular compounds8%
C09DCoating compositions, e.g. paints, varnishes or lacquers8%
C09JAdhesives8%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2013–2017Patents assigned to SAE MAGNETICS HK LTD (3)· patent assignee history
2013–2017Patents assigned to TDK CORP (3)· patent assignee history
2013Patents assigned to ANDO YOUICHI (1)· patent assignee history
2013Patents assigned to HARA SHINJI (1)· patent assignee history
2013Patents assigned to HOSOI RYO (1)· patent assignee history
2013–2017Based in Tokyo, JP· patent location history
2021Based in Nagoya, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SAE MAGNETICS HK LTD32013–2017
TDK CORP32013–2017
ANDO YOUICHIself12013
HARA SHINJI12013
HOSOI RYO12013
Locations
LocationPatentsSpan
Tokyo, JP32013–2017
Nagoya, JP12021