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Inventor

Hung-Jen Liu

Inventor
New Taipei, TW

Overview

4→
Patents
2011–2017
Patent span
Electricity
Primary field (CPC H)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
C09KMaterials for miscellaneous applications, not provided for elsewhere17%
PatentTitleYear
9,822,306'Liquid crystal polymer composite film'20178,986,920'Method for forming quarter-pitch patterns'20158,765,612'Double patterning process'20147,887,996'Method of pattern transfer'2011

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2011–2015Patents assigned to NANYA TECHNOLOGY CORP (3)· patent assignee history
2011Based in Taipei, TW· patent location history
2014–2015Patents assigned to LIU HUNG-JEN (2)· patent assignee history
2014Patents assigned to LEE JENN-WEI (1)· patent assignee history
2014–2015Based in New Taipei, TW· patent location history
2017Patents assigned to IND TECH RES INST (1)· patent assignee history
2017Based in Hsinchu, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NANYA TECHNOLOGY CORP32011–2015
LIU HUNG-JENself22014–2015
IND TECH RES INST12017
LEE JENN-WEI12014
Locations
LocationPatentsSpan
New Taipei, TW22014–2015
Hsinchu, TW12017
Taipei, TW12011