Inventor
Youko Shimizu
Inventor
Hiratsuka, JP
Overview
Patents· 2 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C07Cprimary
C07CAcyclic or carbocyclic compounds25%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds25%
C08LCompositions of macromolecular compounds25%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
PatentTitleYear
10,816,898Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method202010,642,156Resist base material, resist composition and method for forming resist pattern2020Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2020Patents assigned to MITSUBISHI GAS CHEMICAL CO (1)· patent assignee history
2020Based in Hiratsuka, JP· patent location history
2020Based in Kanagawa, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MITSUBISHI GAS CHEMICAL CO | 1 | 2020 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hiratsuka, JP | 1 | 2020 |
| Kanagawa, JP | 1 | 2020 |