Inventor
Naoya HATAKEYAMA
Inventor
JP
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds20%
C07CAcyclic or carbocyclic compounds15%
C09DCoating compositions, e.g. paints, varnishes or lacquers15%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients5%
C08LCompositions of macromolecular compounds5%
G01RMeasuring electric variables5%
H01LSemiconductor devices5%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%
PatentTitleYear
12,510,824Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device202512,379,422Insulation resistance testing device and insulation resistance testing method202511,835,849Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device202311,687,001Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device202311,281,103Composition for forming upper layer film, pattern forming method, resist pattern, and method for manufacturing electronic device202211,150,557Pattern forming method, method for manufacturing electronic device, monomer for producing resin for semiconductor device manufacturing process, resin, method for producing resin, actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to FUJIFILM CORP (5)· patent assignee history
2021–2025Based in JP· patent location history
2025Patents assigned to TOYOTA MOTOR CO LTD (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FUJIFILM CORP | 5 | 2021–2025 |
| TOYOTA MOTOR CO LTD | 1 | 2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 6 | 2021–2025 |