Inventor

CHIN-CHOU LIU

Inventor
TW

Overview

41→
Patents
2021–2026
Patent span
Electricity
Primary field (CPC H)

Patents· 41 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Wprimary
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1025%
H01LSemiconductor devices22%
G06FElectric digital data processing17%
H10DInorganic electric semiconductor devices16%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices4%
G11CStatic stores3%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h103%
Y02PClimate change mitigation technologies in the production or processing of goods3%
G01RMeasuring electric variables1%
H01FMagnets1%
PatentTitleYear
12,532,731Interconnect structure202612,450,412Method and system for determining equivalence of design rule manual data and design rule checking data202512,424,515SOIC chip architecture202512,315,862Integrated circuit device with improved layout202512,277,379Method and system for generating layout diagram including wiring arrangement202512,261,199Thermoelectric cooling of semiconductor devices202512,223,252Through-silicon via in integrated circuit packaging202512,216,981System and method for generating layout diagram including wiring arrangement202512,154,842Heat dissipation structures for three-dimensional system on integrated chip structure202412,079,561Cell region including portion of conductor of another cell region and semiconductor device include the same202412,062,641Integrated circuit including a first semiconductor wafer and a second semiconductor wafer, semiconductor device including a first semiconductor wafer and a second semiconductor wafer and method of manufacturing same202412,039,244Hybrid node chiplet stacking design202412,027,513Layout design methodology for stacked devices202412,009,260Method and system of forming integrated circuit202412,002,776Interconnect structure and method for forming the same202411,983,475Method for manufacturing a cell having pins and semiconductor device based on same202411,935,894Integrated circuit device with improved layout202411,923,302Semiconductor device and method of manufacture202411,923,2713D IC power grid202411,842,133Method and system for determining equivalence of design rule manual data and design rule checking data202311,790,151System for generating layout diagram including wiring arrangement202311,775,727Method for generating layout diagram including wiring arrangement202311,756,951Layout design methodology for stacked devices202311,749,584Heat dissipation structures202311,727,188Semiconductor device including protruding conductor cell regions202311,715,668Integrated antenna on interposer substrate202311,694,973Electromagnetic shielding metal-insulator-metal capacitor structure202311,658,157Integrated circuit including a first semiconductor wafer and a second semiconductor wafer, semiconductor device including a first semiconductor wafer and a second semiconductor wafer and method of manufacturing same202311,586,797Through-silicon vias in integrated circuit packaging202311,585,831Test probing structure202311,574,107Method for manufacturing a cell having pins and semiconductor device based on same202311,545,298Method of forming entangled inductor structures202311,532,580Interconnect structure, semiconductor structure including interconnect structure and method for forming the same202211,495,619Integrated circuit device with improved layout202211,410,929Semiconductor device and method of manufacture202211,397,842Method for generating layout diagram including protruding pin cell regions and semiconductor device based on same202211,387,177Package structure and method for forming the same202211,367,695Interposer with capacitors202211,222,884Layout design methodology for stacked devices202211,211,333Through silicon via optimization for three-dimensional integrated circuits202111,138,360Semiconductor device with filler cell region, method of generating layout diagram and system for same2021

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2021–2026Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (41)· patent assignee history
2021–2026Based in TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TAIWAN SEMICONDUCTOR MFG CO LTD412021–2026
Locations
LocationPatentsSpan
TW412021–2026