Inventor

Richard R. Mett

Inventor

Santa Clara, CA, US

Overview

1998–2014

Patent span

Electricity

Primary field (CPC H)

Patents· 17 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary

H01JElectric discharge tubes or discharge lamps24%

Y10TTechnical subjects covered by former us classification17%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%

G01RMeasuring electric variables10%

C23CCoating metallic material7%

H01RElectrically-conductive connections7%

G01NInvestigating or analysing materials by determining their chemical or physical properties3%

G01TMeasurement of nuclear or x-radiation3%

G05FSystems for regulating electric or magnetic variables3%

H01PWaveguides3%

PatentTitleYear

8,674,694'Coil system and method for post-exposure dosimetry using electron paramagnetic resonance spectroscopy'2014 7,088,101'Aqueous sample holder for EPR and MR spectroscopy'2006 6,828,789'Cavity resonator for electron paramagnetic resonance spectroscopy having axially uniform field'2004 6,825,618'Distributed inductively-coupled plasma source and circuit for coupling induction coils to RF power supply'2004 6,605,177'Substrate support with gas feed-through and method'2003 6,568,346'Distributed inductively-coupled plasma source and circuit for coupling induction coils to RF power supply'2003 6,539,621'Safety guard for an RF connector'2003 6,500,299'Chamber having improved gas feed-through and method'2002 6,304,424'Method and apparatus for minimizing plasma destabilization within a semiconductor wafer processing system'2001 6,273,022'Distributed inductively-coupled plasma source'2001 6,273,736'Safety guard for an RF connector'2001 6,232,236'Apparatus and method for controlling plasma uniformity in a semiconductor wafer processing system'2001 6,198,616'Method and apparatus for supplying a chucking voltage to an electrostatic chuck within a semiconductor wafer processing system'2001 6,005,376'DC power supply'1999 5,989,349'Diagnostic pedestal assembly for a semiconductor wafer processing system'1999 5,952,896'Impedance matching network'1999 5,737,177'Apparatus and method for actively controlling the DC potential of a cathode pedestal'1998

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998–2003Patents assigned to APPLIED MATERIALS INC (12)· patent assignee history

1998–2004Based in Santa Clara, CA, US· patent location history

2001–2014Based in Cedarburg, WI, US· patent location history

2002–2003Based in Whitefish Bay, WI, US· patent location history

2003Patents assigned to APPLIED MATERIAL INC (1)· patent assignee history

2004Patents assigned to MCW RES FOUND INC (1)· patent assignee history

2014Patents assigned to HYDE JAMES S (1)· patent assignee history

2014Patents assigned to METT RICHARD R (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
APPLIED MATERIALS INC	12	1998–2003
APPLIED MATERIAL INC	1	2003
HYDE JAMES S	1	2014
MCW RES FOUND INC	1	2004
METT RICHARD Rself	1	2014

Locations

Location	Patents	Span
Santa Clara, California, US	11	1998–2004
Cedarburg, WI, US	4	2001–2014
Whitefish Bay, WI, US	2	2002–2003