Inventor
Hisao Izawa
Inventor
Kawasaki, JP
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices75%
G01BMeasuring length, thickness or similar linear dimensions25%
PatentTitleYear
5,539,521'Method of and apparatus for measuring pattern positions'19965,459,577'Method of and apparatus for measuring pattern positions'19954,685,805'Small gap measuring apparatus'19874,636,626'Apparatus for aligning mask and wafer used in semiconductor circuit element fabrication'19874,598,242'Mask feed method and apparatus for exposure replicate systems'19864,537,501'Apparatus for the attitude control of plate-form body'1985Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1985–1987Patents assigned to NIPPON KOGAKU KK (4)· patent assignee history
1985–1996Based in Kawasaki, JP· patent location history
1995–1996Patents assigned to NIKON CORP (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NIPPON KOGAKU KK | 4 | 1985–1987 |
| NIKON CORP | 2 | 1995–1996 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kawasaki, JP | 6 | 1985–1996 |