Inventor

Oliver David Jones

Inventor
Watsonville, CA, US

Overview

25→
Patents
1996–2003
Patent span
Electricity
Primary field (CPC H)

Patents· 25 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1048%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests26%
B24BMachines, devices, or processes for grinding or polishing11%
B24DTools for grinding, buffing or sharpening4%
B82YSpecific uses or applications of nanostructures4%
G11BInformation storage based on relative movement between record carrier and transducer4%
Y10TTechnical subjects covered by former us classification2%
PatentTitleYear
6,637,446'Integrated substrate processing system'20036,625,835'Disk cascade scrubber'20036,616,509'Method for performing two wafer preparation operations on vertically oriented semiconductor wafer in single enclosure'20036,615,510'Wafer drying apparatus and method'20036,588,043'Wafer cascade scrubber'20036,482,678'Wafer preparation systems and methods for preparing wafers'20026,477,786'Apparatus for drying batches of disks'20026,461,224'Off-diameter method for preparing semiconductor wafers'20026,457,199'Substrate processing in an immersion, scrub and dry system'20026,446,355'Disk drying apparatus and method'20026,439,978'Substrate polishing system using roll-to-roll fixed abrasive'20026,430,841'Apparatus for drying batches of wafers'20026,427,566'Self-aligning cylindrical mandrel assembly and wafer preparation apparatus including the same'20026,368,192'Wafer preparation apparatus including variable height wafer drive assembly'20026,345,404'Wafer cleaning apparatus'20026,328,640'Wafer preparation apparatus including rotatable wafer preparation assemblies'20016,230,753'Wafer cleaning apparatus'20016,213,136'Robot end-effector cleaner and dryer'20016,143,089'Method of cleaning semiconductor wafers and other substrates'20006,024,107'Apparatus for cleaning robot end effector'20006,012,470'Method of drying a wafer'20005,875,507'Wafer cleaning apparatus'19995,778,554'Wafer spin dryer and method of drying a wafer'19985,490,809'System and method for texturing magnetic data storage disks'19965,486,134'System and method for texturing magnetic data storage disks'1996

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1996–2003Patents assigned to OLIVER DESIGN INC (11)· patent assignee history
1996Based in Santa Cruz, CA, US· patent location history
1998–2003Based in Watsonville, CA, US· patent location history
2000–2003Patents assigned to LAM RES CORP (20)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
LAM RES CORP202000–2003
OLIVER DESIGN INC111996–2003
Locations
LocationPatentsSpan
Watsonville, California, US231998–2003
Santa Cruz, California, US21996