Inventor
Hiroshi Matsutani
Inventor
Hitachi, JP
Overview
Patents· 18 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices16%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1016%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds12%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1012%
Y10TTechnical subjects covered by former us classification7%
C08LCompositions of macromolecular compounds5%
C09DCoating compositions, e.g. paints, varnishes or lacquers5%
G02BOptical elements, systems or apparatus5%
H01LSemiconductor devices5%
C07CAcyclic or carbocyclic compounds3%
PatentTitleYear
10,759,937Polyketone composition including epoxy compound, cured polyketone, optical element, and image display device202010,351,670Aromatic polyketone, method of producing the same, aromatic polyketone composition, aromatic polyketone film, optical element, and image display apparatus201910,173,242Method of manufacturing aromatic polyketone film, aromatic polyketone film, substrate provided with aromatic polyketone film, optical element, and image display device201910,175,577Photosensitive resin composition, method for manufacturing patterned cured film, and electronic component201910,130,974Method of manufacturing aromatic polyketone film, aromatic polyketone film, substrate provided with aromatic polyketone film, optical element, and image display device20189,786,576'Positive-type photosensitive resin composition, method for production of resist pattern, semiconductor device, and electronic device'20179,633,848'Photosensitive resin composition, method for producing patterned cured film, semiconductor element and electronic device'20179,395,626'Photosensitive resin composition, method for manufacturing patterned cured film, and electronic component'20168,836,089'Positive photosensitive resin composition, method of creating resist pattern, and electronic component'20148,461,699'Positive-type photosensitive resin composition, method for producing resist pattern, semiconductor device, and electronic device'20138,426,985'Positive-type photosensitive resin composition, method for producing resist pattern, and electronic component'20138,362,199'Borazine-based resin, process for its production, borazine-based resin composition, insulating film and method for its formation'20137,638,254'Positive photosensitive resin composition, method for forming pattern, and electronic part'20097,625,642'Borazine-based resin, and method for production thereof, borazine based resin composition, insulating coating and method for formation thereof, and electronic parts having the insulating coating'20097,504,471'Sulfur-containing phenolic resin, process for preparing the same, phenol derivatives having thioether structure or disulfide structure, process for preparing the same and epoxy resin composition and adhesive'20097,491,789'Disulfide-containing phenolic resin as curing agent for epoxy resin'20097,435,525'Positive photosensitive resin composition, method for forming pattern, and electronic part'20086,238,628'Photolytic device for breakdown of organic chlorine compounds'2001Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2001Based in Kanagawa, JP· patent location history
2008–2019Based in Ibaraki, JP· patent location history
2009–2020Patents assigned to HITACHI CHEMICAL CO LTD (14)· patent assignee history
2009–2017Based in Hitachi, JP· patent location history
2009–2017Based in Tsukuba, JP· patent location history
2013–2017Patents assigned to MATSUTANI HIROSHI (5)· patent assignee history
2013–2017Patents assigned to UENO TAKUMI (4)· patent assignee history
2013–2017Patents assigned to NANAUMI KEN (3)· patent assignee history
2013–2017Patents assigned to NICOLAS ALEXANDRE (3)· patent assignee history
2018–2020Based in Tokyo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI CHEMICAL CO LTD | 14 | 2009–2020 |
| MATSUTANI HIROSHIself | 5 | 2013–2017 |
| UENO TAKUMI | 4 | 2013–2017 |
| NANAUMI KEN | 3 | 2013–2017 |
| NICOLAS ALEXANDRE | 3 | 2013–2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hitachi, JP | 6 | 2009–2017 |
| Tokyo, JP | 4 | 2018–2020 |
| Ibaraki, JP | 4 | 2008–2019 |
| Tsukuba, JP | 3 | 2009–2017 |
| Kanagawa, JP | 1 | 2001 |