Inventor

Hao Liu

Inventor
Shanghai, CN

Overview

6→
Patents
2010–2021
Patent span
Chemistry
Primary field (CPC C)

Patents· 6 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C08Gprimary
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds13%
C09DCoating compositions, e.g. paints, varnishes or lacquers13%
A61BDiagnosis7%
A61MDevices for introducing media into, or onto, the body7%
C09JAdhesives7%
C22CAlloys7%
G02BOptical elements, systems or apparatus7%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them7%
H01LSemiconductor devices7%
H04NPictorial communication, e.g. television7%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2010Patents assigned to YIEH UNITED STEEL CORP (1)· patent assignee history
2010Based in Kaohsiung, TW· patent location history
2020Patents assigned to COVESTRO DEUTSCHLAND AG (2)· patent assignee history
2020Based in Shanghai, CN· patent location history
2021Patents assigned to CORETRONIC CORP (1)· patent assignee history
2021Patents assigned to MICRON TECHNOLOGY INC (1)· patent assignee history
2021Patents assigned to PIONEER MAT INC CHENGDU (1)· patent assignee history
2021Based in Sichuan, CN· patent location history
2021Based in Hsinchu, TW· patent location history
2021Based in Meridian, ID, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
COVESTRO DEUTSCHLAND AG22020
CORETRONIC CORP12021
MICRON TECHNOLOGY INC12021
PIONEER MAT INC CHENGDU12021
YIEH UNITED STEEL CORP12010
Locations
LocationPatentsSpan
Shanghai, CN22020
Sichuan, CN12021
Hsinchu, TW12021
Meridian, ID, US12021
Kaohsiung, TW12010