Inventor

Yong-Jhin Cho

Inventor

Hwaseong-si, KR

Overview

15→

Patents

2014–2021

Patent span

Electricity

Primary field (CPC H)

Patents· 15 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Lprimary

H01LSemiconductor devices27%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1024%

F26BDrying solid materials or objects by removing liquid therefrom7%

B08BCleaning in general4%

C11DDetergent compositions4%

H10DInorganic electric semiconductor devices4%

H10HInorganic light-emitting semiconductor devices having potential barriers4%

B05BSpraying apparatus2%

B05CApparatus for applying fluent materials to surfaces, in general2%

B65DContainers for storage or transport of articles or materials, e.g. bags, barrels, bottles, boxes, cans, cartons, crates, drums, jars, tanks, hoppers, forwarding containers2%

PatentTitleYear

11,038,265Semiconductor-based beamforming antenna2021 11,005,004Micro light emitting diode (LED) structure, method for manufacturing the same and display including the same2021 10,825,698Substrate drying apparatus, facility of manufacturing semiconductor device, and method of drying substrate2020 10,818,522Process chamber for a supercritical process and apparatus for treating substrates having the same2020 10,435,234Chemical liquid supply apparatus and semiconductor processing apparatus having the same2019 10,361,100Apparatus and methods for treating a substrate2019 9,941,110Manufacturing method and fluid supply system for treating substrate2018 9,934,959Method and apparatus for purifying cleaning agent2018 9,903,651'Sealing member and substrate processing apparatus including the same'2018 9,627,233'Substrate treating apparatus'2017 9,534,839'Apparatus and methods for treating a substrate'2017 9,524,864'Manufacturing method and fluid supply system for treating substrate'2016 9,394,509'Cleaning solution composition and method of cleaning semiconductor device using the same'2016 9,027,576'Substrate treatment systems using supercritical fluid'2015 8,795,541'Substrate processing method and substrate processing system for performing the same'2014

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2014–2020Patents assigned to SAMSUNG ELECTRONICS CO LTD (13)· patent assignee history

2014–2015Patents assigned to CHO YONG-JHIN (2)· patent assignee history

2014–2015Patents assigned to OH JUNG-MIN (2)· patent assignee history

2014Patents assigned to BAE SANG-WON (1)· patent assignee history

2014Based in Suwon-si, KR· patent location history

2015–2020Based in Hwaseong-si, KR· patent location history

2018Patents assigned to CHO YONG JHIN (1)· patent assignee history

2018Based in Gyeonggi-do, KR· patent location history

2021Based in Daejeon, KR· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
SAMSUNG ELECTRONICS CO LTD	13	2014–2020
CHO YONG-JHINself	2	2014–2015
OH JUNG-MIN	2	2014–2015
BAE SANG-WON	1	2014
CHO YONG JHINself	1	2018

Locations

Location	Patents	Span
Hwaseong-si, KR	11	2015–2020
Daejeon, KR	2	2021
Gyeonggi-do, KR	1	2018
Suwon-si, KR	1	2014