Inventor
HYEON WOO PARK
Inventor
KR
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C09Kprimary
C09KMaterials for miscellaneous applications, not provided for elsewhere27%
H01LSemiconductor devices27%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1027%
C23FNon-mechanical removal of metallic material from surface13%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients7%
PatentTitleYear
12,031,077Etching composition for metal nitride layer and etching method using the same202411,987,740Silicon nitride film etching composition and etching method using the same202411,939,505Silicon nitride film etching composition and etching method using the same202411,149,201Silicon nitride layer etching composition2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2024Patents assigned to ENF TECHNOLOGY CO LTD (4)· patent assignee history
2021–2024Based in KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ENF TECHNOLOGY CO LTD | 4 | 2021–2024 |
Locations
| Location | Patents | Span |
|---|---|---|
| KR | 4 | 2021–2024 |