Inventor

Hidehiko Mashimo

Inventor

Yokosuka, JP

Overview

2010–2011

Patent span

Physics

Primary field (CPC G)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%

G05BControl or regulating systems in general33%

B23QDetails, components, or accessories for machine tools, e.g. arrangements for copying or controlling17%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2010–2011Patents assigned to SUMITOMO HEAVY INDUSTRIES (2)· patent assignee history

2010Based in Kanagawa, JP· patent location history

2011Based in Yokosuka, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
SUMITOMO HEAVY INDUSTRIES	2	2010–2011

Locations

Location	Patents	Span
Yokosuka, JP	1	2011
Kanagawa, JP	1	2010