Inventor
MING-CHE CHUNG
Inventor
TW
Overview
Patents· 3 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds20%
C08JWorking-up20%
C09KMaterials for miscellaneous applications, not provided for elsewhere20%
PatentTitleYear
12,321,097Method of removing photoresist, laminate, method of forming metallic pattern, polyimide resin and stripper202511,851,597Etchant composition, tackifier, alkaline solution, method of removing polyimide and etching process202311,609,496Method of forming patterned polyimide layer2023Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2023–2025Patents assigned to ECHEM SOLUTIONS CORP (3)· patent assignee history
2023–2025Based in TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ECHEM SOLUTIONS CORP | 3 | 2023–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| TW | 3 | 2023–2025 |