Inventor
Heng-Jen Lee
Inventor
Hsinchu County, TW
Overview
Patents· 29 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices41%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
H01LSemiconductor devices9%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
H01JElectric discharge tubes or discharge lamps5%
B67DDispensing, delivering or transferring liquids, not otherwise provided for3%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them3%
Y10TTechnical subjects covered by former us classification3%
B82YSpecific uses or applications of nanostructures2%
F27BFurnaces, kilns, ovens or retorts in general2%
PatentTitleYear
10,558,120System and method for supplying and dispensing bubble-free photolithography chemical solutions202010,274,839Two-dimensional marks201910,006,717Adaptive baking system and method of using the same20189,817,315'System and method for supplying and dispensing bubble-free photolithography chemical solutions'20179,690,212'Hybrid focus-exposure matrix'20179,671,685'Lithographic plane check for mask processing'20179,632,426'In-situ immersion hood cleaning'20179,601,324'Method of making wafer assembly'20179,196,515'Litho cluster and modulization to enhance productivity'20159,111,982'Wafer assembly with carrier wafer'20158,955,530'System and method for cleaning a wafer chuck'20158,906,599'Enhanced scanner throughput system and method'20148,903,532'Litho cluster and modulization to enhance productivity'20148,860,941'Tool induced shift reduction determination for overlay metrology'20148,848,163'Photoresist materials and photolithography processes'20148,625,076'Wafer edge exposure module'20148,609,545'Method to improve mask critical dimension uniformity (CDU)'20138,592,102'Cost-effective method for extreme ultraviolet (EUV) mask production'20138,544,317'Semiconductor processing apparatus with simultaneously movable stages'20138,507,177'Photoresist materials and photolithography processes'20138,338,262'Dual wavelength exposure method and system for semiconductor device manufacturing'20128,237,132'Method and apparatus for reducing down time of a lithography system'20128,239,788'Frame cell for shot layout flexibility'20128,183,701'Structure of stacking scatterometry based overlay marks for marks footprint reduction'20128,101,530'Lithography patterning method'20128,101,340'Method of inhibiting photoresist pattern collapse'20127,972,761'Photoresist materials and photolithography process'20117,901,854'Wafer edge exposure unit'20117,393,616'Line end spacing measurement'2008Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2008–2015Patents assigned to TAIWAN SEMICONDUCTOR MFG (19)· patent assignee history
2008–2017Based in Hsinchu County, TW· patent location history
2011–2014Based in Hsinchu, TW· patent location history
2012–2017Patents assigned to LEE HENG-JEN (19)· patent assignee history
2012–2017Patents assigned to LIN CHIN-HSIANG (10)· patent assignee history
2012–2017Patents assigned to HUANG I-HSIUNG (9)· patent assignee history
2013–2020Based in Baoshan Township, TW· patent location history
2015–2020Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (9)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| LEE HENG-JENself | 19 | 2012–2017 |
| TAIWAN SEMICONDUCTOR MFG | 19 | 2008–2015 |
| LIN CHIN-HSIANG | 10 | 2012–2017 |
| HUANG I-HSIUNG | 9 | 2012–2017 |
| TAIWAN SEMICONDUCTOR MFG CO LTD | 9 | 2015–2020 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hsinchu County, TW | 14 | 2008–2017 |
| Baoshan Township, TW | 11 | 2013–2020 |
| Hsinchu, TW | 4 | 2011–2014 |