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Inventor

Tamotsu Abe

Inventor
Hiratsuka, JP

Overview

49→
Patents
1988–2020
Patent span
Physics
Primary field (CPC G)

Patents· 49 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H05Gprimary
H05GX-ray technique34%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices29%
G21KHandling of particles or ionising radiation not otherwise provided for12%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them4%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light4%
B23KSoldering or unsoldering3%
Y10TTechnical subjects covered by former us classification3%
B05BSpraying apparatus2%
B82YSpecific uses or applications of nanostructures2%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light2%
PatentTitleYear
10,764,986Extreme ultraviolet light generation apparatus202010,314,152Extreme ultraviolet light generation apparatus201910,172,225Extreme ultraviolet light generation apparatus201910,126,657Extreme ultraviolet light generating apparatus201810,102,938Extreme ultraviolet light generating apparatus20189,986,629Extreme ultraviolet light generation apparatus20189,942,973Extreme ultraviolet light generation apparatus20189,872,372'Extreme ultraviolet light generation device'20189,731,848'Bread conveying apparatus'20179,578,730'Extreme ultraviolet light generation apparatus and extreme ultraviolet light generation system'20179,510,433'Extreme ultraviolet light generation apparatus'20169,310,686'Target supply device and target supply method'20168,872,142'Extreme ultraviolet light generation apparatus'20148,817,838'Laser device with optical element module on separate plate'20148,804,902'Collector mirror exchanging apparatus and method for extreme ultraviolet light source apparatus'20148,759,804'Chamber apparatus and extreme ultraviolet light generation system'20148,705,035'Target generation device'20148,698,112'Extreme ultraviolet light generation apparatus'20148,698,116'Extreme ultra violet light source apparatus'20148,629,417'Extreme ultraviolet light generation apparatus'20148,624,208'Extreme ultraviolet light generation system'20148,569,723'Extreme ultraviolet light source apparatus'20138,558,202'Extreme ultraviolet light source apparatus'20138,536,551'Extreme ultra violet light source apparatus'20138,536,550'Method and apparatus for cleaning collector mirror in EUV light generator'20138,507,883'Extreme ultraviolet light source apparatus'20138,492,738'Apparatus for and method of withdrawing ions in EUV light production apparatus'20138,481,984'Extreme ultra violet light source apparatus'20138,477,412'Collector mirror exchanging apparatus and method for extreme ultraviolet light source apparatus'20138,450,706'Extreme ultraviolet light source apparatus'20138,445,876'Extreme ultraviolet light source apparatus'20138,445,877'Extreme ultraviolet light source apparatus and target supply device'20138,436,328'Extreme ultraviolet light source apparatus'20138,324,601'Extreme ultra violet light source apparatus'20128,294,129'Extreme ultraviolet light source apparatus'20128,288,743'Apparatus for and method of withdrawing ions in EUV light production apparatus'20128,256,441'Method for cleaning optical element of EUV light source device and optical element cleaning device'20128,242,474'Extreme ultraviolet light generation apparatus'20128,212,228'Extreme ultra violet light source apparatus'20128,173,984'Extreme ultraviolet light source apparatus'20128,003,962'Extreme ultraviolet light source apparatus and nozzle protection device'20118,000,361'Laser system'20117,999,241'Extreme ultraviolet light source apparatus'20117,923,705'Extreme ultra violet light source apparatus'20117,880,153'Extreme ultra violet light source apparatus'20117,842,937'Extreme ultra violet light source apparatus'20107,732,794'Extreme ultra violet light source apparatus'20107,683,355'Extreme ultra violet light source apparatus'20104,753,969'Diaphragm for electroacoustic transducer'1988

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2010–2020Based in Hiratsuka, JP· patent location history
2010–2014Based in Odawara, JP· patent location history
2011–2020Patents assigned to GIGAPHOTON INC (42)· patent assignee history
2012–2014Patents assigned to ABE TAMOTSU (24)· patent assignee history
2012–2014Patents assigned to WAKABAYASHI OSAMU (13)· patent assignee history
2012–2014Patents assigned to HOSHINO HIDEO (11)· patent assignee history
2012–2014Patents assigned to NAGAI SHINJI (8)· patent assignee history
2012–2014Based in Kanagawa, JP· patent location history
2014–2019Based in Oyama, JP· patent location history
2017Based in Fujisawa, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
GIGAPHOTON INC422011–2020
ABE TAMOTSUself242012–2014
WAKABAYASHI OSAMU132012–2014
HOSHINO HIDEO112012–2014
NAGAI SHINJI82012–2014
Locations
LocationPatentsSpan
Hiratsuka, JP232010–2020
Odawara, JP102010–2014
Oyama, JP92014–2019
Kanagawa, JP42012–2014
Fujisawa, JP12017