Inventor

Masaru Nakaniwa

Inventor
Ebina, JP

Overview

3→
Patents
1997–1999
Patent span
Chemistry
Primary field (CPC C)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material40%
F04CRotary-piston, or oscillating-piston, positive-displacement machines for liquids20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
Y10TTechnical subjects covered by former us classification20%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1997–1999Patents assigned to EBARA CORP (3)· patent assignee history
1997Based in Tokyo, JP· patent location history
1999Based in Ebina, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
EBARA CORP31997–1999
Locations
LocationPatentsSpan
Ebina, JP21999
Tokyo, JP11997