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Inventor

Tomonori Fujiwara

Inventor
Kyoto, JP

Overview

9→
Patents
2006–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 9 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1036%
H10DInorganic electric semiconductor devices23%
B08BCleaning in general18%
H01LSemiconductor devices14%
C23CCoating metallic material5%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests5%
PatentTitleYear
10,720,333Substrate processing apparatus and substrate processing method202010,199,231Substrate processing apparatus and substrate processing method201910,058,900Substrate processing apparatus and substrate processing method20188,021,987'Method of modifying insulating film'20117,655,574'Method of modifying insulating film'20107,622,402'Method for forming underlying insulation film'20097,368,384'Film formation apparatus and method of using the same'20087,084,023'Method of manufacturing semiconductor device, film-forming apparatus, and storage medium'20067,041,546'Film forming method for depositing a plurality of high-k dielectric films'2006

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2006–2011Patents assigned to TOKYO ELECTRON LTD (6)· patent assignee history
2006–2008Based in Tokyo, JP· patent location history
2009–2011Based in Nirasaki, JP· patent location history
2018–2020Patents assigned to SCREEN HOLDINGS CO LTD (3)· patent assignee history
2018–2020Based in Kyoto, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO ELECTRON LTD62006–2011
SCREEN HOLDINGS CO LTD32018–2020
Locations
LocationPatentsSpan
Kyoto, JP32018–2020
Nirasaki, JP32009–2011
Tokyo, JP32006–2008