Inventor

Naoya Yoshida

Inventor
Tokyo, JP

Overview

21→
Patents
2004–2020
Patent span
Mechanical engineering
Primary field (CPC F)

Patents· 21 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

A61Kprimary
A61KPreparations for medical, dental or toiletry purposes17%
H02KDynamo-electric machines12%
F04BPositive-displacement machines for liquids10%
F04DNon-positive-displacement pumps10%
LOC0810%
C03CChemical composition of glasses, glazes or vitreous enamels5%
C09DCoating compositions, e.g. paints, varnishes or lacquers5%
F04CRotary-piston, or oscillating-piston, positive-displacement machines for liquids5%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%
A61PSpecific therapeutic activity of chemical compounds or medicinal preparations2%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2004Based in Kyotanabe, JP· patent location history
2011Based in Ebina, JP· patent location history
2012–2017Patents assigned to ASAHI KASEI CHEMICALS CORP (6)· patent assignee history
2012–2015Patents assigned to YOSHIDA NAOYA (5)· patent assignee history
2012–2014Patents assigned to YAGINUMA YOSHIHITO (3)· patent assignee history
2012–2020Based in Tokyo, JP· patent location history
2014–2016Patents assigned to PLUS KK (5)· patent assignee history
2016–2019Patents assigned to EBARA CORP (5)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASAHI KASEI CHEMICALS CORP62012–2017
EBARA CORP52016–2019
PLUS KK52014–2016
YOSHIDA NAOYAself52012–2015
YAGINUMA YOSHIHITO32012–2014
Locations
LocationPatentsSpan
Tokyo, JP182012–2020
Ebina, JP22011
Kyotanabe, JP12004