Inventor
Michael E. Adel
Inventor
Zichron Yaakov, IL
Overview
Patents· 81 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices28%
G01NInvestigating or analysing materials by determining their chemical or physical properties12%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
G06VImage or video recognition or understanding7%
H01LSemiconductor devices7%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
G01BMeasuring length, thickness or similar linear dimensions5%
G06TImage data processing or generation, in general5%
G06FElectric digital data processing5%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light4%
PatentTitleYear
10,901,325Determining the impacts of stochastic behavior on overlay metrology data202110,890,436Overlay targets with orthogonal underlayer dummyfill202110,763,146Recipe optimization based zonal analysis202010,726,169Target and process sensitivity analysis to requirements202010,705,434Verification metrology target and their design202010,579,768Process compatibility improvement by fill factor modulation202010,451,412Apparatus and methods for detecting overlay errors using scatterometry201910,409,171Overlay control with non-zero offset prediction201910,387,608Metrology target identification, design and verification201910,203,200Analyzing root causes of process variation in scatterometry metrology201910,025,285On-product derivation and adjustment of exposure parameters in a directed self-assembly process20189,910,953'Metrology target identification, design and verification'20189,903,711'Feed forward of metrology data in a metrology system'20189,875,946On-device metrology20189,702,693'Apparatus for measuring overlay errors'20179,576,861'Method and system for universal target based inspection and metrology'20179,559,019'Metrology through use of feed forward feed sideways and measurement cell re-use'20179,558,978'Material handling with dedicated automated material handling system'20179,347,879'Apparatus and methods for detecting overlay errors using scatterometry'20169,151,712'Rule checking for metrology and inspection'20159,116,442'Feedforward/feedback litho process control of stress and overlay'20158,930,156'Metrology through use of feed forward feed sideways and measurement cell re-use'20158,908,175'Flexible scatterometry metrology system and method'20148,456,641'Optical system'20138,390,808'Enhanced OVL dummy field enabling “on-the-fly†OVL measurement methods'20138,330,281'Overlay marks, methods of overlay mark design and methods of overlay measurements'20128,243,273'Enhanced OVL dummy field enabling “on-the-fly†OVL measurement methods'20128,214,771'Scatterometry metrology target design optimization'20128,142,966'Substrate matrix to decouple tool and process effects'20128,111,376'Feedforward/feedback litho process control of stress and overlay'20127,933,016'Apparatus and methods for detecting overlay errors using scatterometry'20117,879,627'Overlay marks and methods of manufacturing such marks'20117,876,438'Apparatus and methods for determining overlay and uses of same'20117,876,440'Apparatus and methods for detecting overlay errors using scatterometry'20117,804,994'Overlay metrology and control method'20107,684,039'Overlay metrology using the near infra-red spectral range'20107,679,069'Method and system for optimizing alignment performance in a fleet of exposure tools'20107,671,990'Cross hatched metrology marks and associated method of use'20107,663,753'Apparatus and methods for detecting overlay errors using scatterometry'20107,608,468'Apparatus and methods for determining overlay and uses of same'20097,602,491'Optical gain approach for enhancement of overlay and alignment systems performance'20097,571,422'Method for generating a design rule map having spatially varying overlay budget'20097,566,517'Feature printability optimization by optical tool'20097,564,557'Apparatus and methods for detecting overlay errors using scatterometry'20097,557,921'Apparatus and methods for optically monitoring the fidelity of patterns produced by photolitographic tools'20097,528,953'Target acquisition and overlay metrology based on two diffracted orders imaging'20097,528,941'Order selected overlay metrology'20097,526,749'Methods and apparatus for designing and using micro-targets in overlay metrology'20097,440,105'Continuously varying offset mark and methods of determining overlay'20087,433,040'Apparatus and methods for detecting overlay errors using scatterometry'20087,385,699'Apparatus and methods for detecting overlay errors using scatterometry'20087,379,183'Apparatus and methods for detecting overlay errors using scatterometry'20087,368,208'Measuring phase errors on phase shift masks'20087,355,291'Overlay marks, methods of overlay mark design and methods of overlay measurements'20087,352,451'System method and structure for determining focus accuracy'20087,346,878'Apparatus and methods for providing in-chip microtargets for metrology or inspection'20087,317,531'Apparatus and methods for detecting overlay errors using scatterometry'20087,317,824'Overlay marks, methods of overlay mark design and methods of overlay measurements'20087,310,789'Use of overlay diagnostics for enhanced automatic process control'20077,301,634'Apparatus and methods for detecting overlay errors using scatterometry'20077,298,481'Apparatus and methods for detecting overlay errors using scatterometry'20077,289,213'Apparatus and methods for detecting overlay errors using scatterometry'20077,280,212'Apparatus and methods for detecting overlay errors using scatterometry'20077,274,814'Overlay marks, methods of overlay mark design and methods of overlay measurements'20077,242,477'Apparatus and methods for detecting overlay errors using scatterometry'20077,181,057'Overlay marks, methods of overlay mark design and methods of overlay measurements'20077,177,457'Overlay marks, methods of overlay mark design and methods of overlay measurements'20077,111,256'Use of overlay diagnostics for enhanced automatic process control'20067,075,639'Method and mark for metrology of phase errors on phase shift masks'20067,068,833'Overlay marks, methods of overlay mark design and methods of overlay measurements'20066,985,618'Overlay marks, methods of overlay mark design and methods of overlay measurements'20066,928,628'Use of overlay diagnostics for enhanced automatic process control'20056,921,916'Overlay marks, methods of overlay mark design and methods of overlay measurements'20056,556,853'Spectral bio-imaging of the eye'20036,419,361'Spectral bio-imaging of the eye'20026,198,532'Spectral bio-imaging of the eye'20016,142,629'Spectral imaging using illumination of preselected spectral content'20006,082,892'Temperature measuring method and apparatus'20005,856,871'Film thickness mapping using interferometric spectral imaging'19995,823,681'Multipoint temperature monitoring apparatus for semiconductor wafers during processing'19985,322,361'Method and apparatus for measuring temperature'1994Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1994Based in Zikhron Yacov, IL· patent location history
1998–1999Based in Zichron Yakov, IL· patent location history
1999–2003Patents assigned to APPLIED SPECTRAL IMAGING LTD (5)· patent assignee history
2000–2021Based in Zichron Yaakov, IL· patent location history
2000Based in Yaakov, IL· patent location history
2005–2012Patents assigned to KLA TENCOR TECH CORP (37)· patent assignee history
2006–2021Patents assigned to KLA TENCOR CORP (33)· patent assignee history
2009–2017Based in Zikhron-Yaakov, IL· patent location history
2012–2017Patents assigned to ADEL MICHAEL (9)· patent assignee history
2012–2013Patents assigned to ADEL MICHAEL E (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KLA TENCOR TECH CORP | 37 | 2005–2012 |
| KLA TENCOR CORP | 33 | 2006–2021 |
| ADEL MICHAELself | 9 | 2012–2017 |
| APPLIED SPECTRAL IMAGING LTD | 5 | 1999–2003 |
| ADEL MICHAEL Eself | 3 | 2012–2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Zichron Yaakov, IL | 70 | 2000–2021 |
| Zikhron-Yaakov, IL | 7 | 2009–2017 |
| Zichron Yakov, IL | 2 | 1998–1999 |
| Yaakov, IL | 1 | 2000 |
| Zikhron Yacov, IL | 1 | 1994 |