Inventor
Susanne Beder
Inventor
Aalen, DE
Overview
Patents· 31 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices47%
G02BOptical elements, systems or apparatus41%
G01BMeasuring length, thickness or similar linear dimensions5%
B82YSpecific uses or applications of nanostructures3%
G03HHolographic processes or apparatus2%
G21KHandling of particles or ionising radiation not otherwise provided for2%
PatentTitleYear
11,119,413Imaging optical unit for imaging an object field into an image field202110,606,048Imaging optical unit for a metrology system for examining a lithography mask20209,459,539'Imaging optical unit for a projection exposure apparatus'20169,164,396'Projection lens system of a microlithographic projection exposure installation'20158,908,269'Immersion catadioptric projection objective having two intermediate images'20148,730,572'Catadioptric projection objective'20148,416,490'Catadioptric projection objective'20138,355,201'Catadioptric projection objective'20138,325,426'Projection objective of a microlithographic projection exposure apparatus'20128,319,944'Projection lens system of a microlithographic projection exposure installation'20128,208,199'Catadioptric projection objective'20128,208,198'Catadioptric projection objective'20128,199,400'Catadioptric projection objective'20128,068,276'Projection objective for lithography'20118,031,326'Illumination system or projection lens of a microlithographic exposure system'20117,982,969'Projection objective of a microlithographic projection exposure apparatus'20117,848,031'Hologram and method of manufacturing an optical element using a hologram'20107,835,073'Projection objective for lithography'20107,782,440'Projection lens system of a microlithographic projection exposure installation'20107,782,538'Projection objective having a high aperture and a planar end surface'20107,728,987'Method of manufacturing an optical element'20107,719,658'Imaging system for a microlithographical projection light system'20107,710,640'Projection objective of a microlithographic projection exposure apparatus'20107,589,903'Projection objective adapted for use with different immersion fluids or liquids, method of conversion of such and production method'20097,570,343'Microlithographic projection exposure apparatus'20097,474,469'Arrangement of optical elements in a microlithographic projection exposure apparatus'20097,466,489'Projection objective having a high aperture and a planar end surface'20087,428,105'Objectives as a microlithography projection objective with at least one liquid lens'20087,385,764'Objectives as a microlithography projection objective with at least one liquid lens'20087,301,707'Projection optical system and method'20077,061,626'Method of manufacturing an optical element using a hologram'2006Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2006–2010Patents assigned to ZEISS CARL SMT AG (14)· patent assignee history
2006–2021Based in Aalen, DE· patent location history
2008–2014Patents assigned to BEDER SUSANNE (10)· patent assignee history
2008–2014Patents assigned to SINGER WOLFGANG (8)· patent assignee history
2011–2021Patents assigned to ZEISS CARL SMT GMBH (16)· patent assignee history
2011–2014Patents assigned to EPPLE ALEXANDER (8)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ZEISS CARL SMT GMBH | 16 | 2011–2021 |
| ZEISS CARL SMT AG | 14 | 2006–2010 |
| BEDER SUSANNEself | 10 | 2008–2014 |
| EPPLE ALEXANDER | 8 | 2011–2014 |
| SINGER WOLFGANG | 8 | 2008–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Aalen, DE | 31 | 2006–2021 |