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Inventor

Toshihiko Murai

Inventor
Tokyo, JP

Overview

3→
Patents
2010–2019
Patent span
Chemistry
Primary field (CPC C)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C07Dprimary
C07DHeterocyclic compounds33%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds17%
C09BOrganic dyes or closely-related compounds for producing dyes, e.g. pigments17%
PatentTitleYear
10,386,721Pattern formation method and electronic device manufactured using same20198,680,268'Sulfonic acid derivative compound and novel naphthalic acid derivative compound'20147,696,257'Oxime ester compound and photopolymerization initiator containing such compound'2010

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2010–2019Patents assigned to ADEKA CORP (3)· patent assignee history
2010–2019Based in Tokyo, JP· patent location history
2014Patents assigned to FUJITA SHOHEI (1)· patent assignee history
2014Patents assigned to MAKABE YOSHIE (1)· patent assignee history
2014Patents assigned to MURAI TOSHIHIKO (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ADEKA CORP32010–2019
FUJITA SHOHEI12014
MAKABE YOSHIE12014
MURAI TOSHIHIKOself12014
Locations
LocationPatentsSpan
Tokyo, JP32010–2019