LexDanaLexDanabeta
Inventor

Jan Wietse Ricolt Ten Cate

Inventor
Staphorst, NL

Overview

3→
Patents
2002–2006
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices100%
PatentTitleYear
7,061,583'Lithography apparatus'20066,452,662'Lithography apparatus'20026,404,499'Lithography apparatus with filters for optimizing uniformity of an image'2002

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2002–2006Patents assigned to ASML NETHERLANDS BV (3)· patent assignee history
2002–2006Based in Staphorst, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV32002–2006
Locations
LocationPatentsSpan
Staphorst, NL32002–2006