Inventor
KOJI KAGAWA
Inventor
JP
Overview
Patents· 8 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
B08BCleaning in general13%
C09KMaterials for miscellaneous applications, not provided for elsewhere13%
C23FNon-mechanical removal of metallic material from surface4%
F26BDrying solid materials or objects by removing liquid therefrom4%
PatentTitleYear
12,506,012Substrate processing method and substrate processing apparatus202512,203,021Substrate processing device and etching liquid202512,020,943Substrate processing method and substrate processing apparatus202411,875,991Substrate treatment method and substrate treatment device202411,626,294Substrate processing method, substrate processing apparatus and recording medium202311,551,941Substrate cleaning method202311,551,931Substrate processing apparatus, substrate processing method, and storage medium storing program for executing substrate processing method202311,306,249Substrate processing method, substrate processing device and etching liquid2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2025Patents assigned to TOKYO ELECTRON LTD (8)· patent assignee history
2022–2025Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 8 | 2022–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 8 | 2022–2025 |