Inventor
Chan Hwang
Inventor
Seoul, KR
Overview
Patents· 11 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices19%
G06FElectric digital data processing16%
H01LSemiconductor devices13%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
G01RMeasuring electric variables6%
G06TImage data processing or generation, in general6%
G11CStatic stores6%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h106%
G01BMeasuring length, thickness or similar linear dimensions3%
G09GArrangements or circuits for control of indicating devices using static means to present variable information3%
PatentTitleYear
10,566,252Overlay-correction method and a control system using the same202010,444,276Computing device executing program performing method of analyzing power noise in semiconductor device, semiconductor device design method, and program storage medium storing program201910,198,541Circuit modeling system and circuit modeling method based on net list simplification technique201910,119,811Alignment mark, method of measuring wafer alignment, and method of manufacturing a semiconductor device using the method of measuring wafer alignment20189,958,495Computing device executing program performing method of analyzing power noise in semiconductor device, semiconductor device design method, and program storage medium storing program20189,747,682'Methods for measuring overlays'20179,465,900'System and method for designing semiconductor package using computing system, apparatus for fabricating semiconductor package including the system, and semiconductor package designed by the method'20169,281,250'Method of detecting an asymmetric portion of an overlay mark and method of measuring an overlay including the same'20167,799,490'Optical masks and methods for measuring aberration of a beam'20107,670,725'Optical masks and methods for measuring aberration of a beam'20106,539,528'Methods, systems, and computer program products for designing an integrated circuit that use an information repository having circuit block layout information'2003Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2003–2020Patents assigned to SAMSUNG ELECTRONICS CO LTD (11)· patent assignee history
2003Based in Yongin, KR· patent location history
2010–2020Based in Seoul, KR· patent location history
2016Patents assigned to CHEON YOUNG-HOE (1)· patent assignee history
2016Patents assigned to HWANG BO-SUN (1)· patent assignee history
2016Patents assigned to HWANG CHAN-SEOK (1)· patent assignee history
2016Patents assigned to JEONG JAE-HOON (1)· patent assignee history
2016–2019Based in Seongnam-si, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SAMSUNG ELECTRONICS CO LTD | 11 | 2003–2020 |
| CHEON YOUNG-HOE | 1 | 2016 |
| HWANG BO-SUN | 1 | 2016 |
| HWANG CHAN-SEOKself | 1 | 2016 |
| JEONG JAE-HOON | 1 | 2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Seoul, KR | 6 | 2010–2020 |
| Seongnam-si, KR | 4 | 2016–2019 |
| Yongin, KR | 1 | 2003 |