Inventor
Eugeni E. Egorov
Inventor
Moscow, RU
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices100%
PatentTitleYear
7,401,318'Method and apparatus for optimizing fragmentation of boundaries for optical proximity correction (OPC) purposes'20087,039,896'Gradient method of mask edge correction'20066,988,260'Method and apparatus for optimizing fragmentation of boundaries for optical proximity correction (OPC) purposes'20066,934,410'Mask correction for photolithographic processes'2005Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2005–2006Patents assigned to LSI LOGIC CORP (3)· patent assignee history
2005–2008Based in Moscow, RU· patent location history
2008Patents assigned to LSI CORP (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| LSI LOGIC CORP | 3 | 2005–2006 |
| LSI CORP | 1 | 2008 |
Locations
| Location | Patents | Span |
|---|---|---|
| Moscow, RU | 4 | 2005–2008 |