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Inventor

Hisanori Akimaru

Inventor
Tokyo, JP

Overview

2→
Patents
2016–2018
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices100%
PatentTitleYear
10,095,110Photosensitive resin composition, method for forming resist pattern, and method for producing metallic pattern20189,417,522'Photosensitive resin composition and method for producing resist pattern'2016

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2016–2018Patents assigned to JSR CORP (2)· patent assignee history
2016Based in Minato-ku, JP· patent location history
2018Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
JSR CORP22016–2018
Locations
LocationPatentsSpan
Tokyo, JP12018
Minato-ku, JP12016