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Inventor

Masaaki Aoyama

Inventor
Tokyo, JP

Overview

23→
Patents
1986–2005
Patent span
General tagging of new technological developments
Primary field (CPC Y)

Patents· 23 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests12%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices9%
Y10TTechnical subjects covered by former us classification9%
C03BManufacture, shaping, or supplementary processes7%
Y02PClimate change mitigation technologies in the production or processing of goods7%
G02BOptical elements, systems or apparatus6%
C30BSingle-crystal growth4%
H10DInorganic electric semiconductor devices4%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%
PatentTitleYear
6,884,670'Dry etching with reduced damage to MOS device'20056,713,492'N-acyloxylated cycloalkyl compounds, composition containing the same and methods of use therefor'20046,707,528'Exposure apparatus having independent chambers and methods of making the same'20046,697,145'Substrate processing apparatus for coating photoresist on a substrate and forming a predetermined pattern on a substrate by exposure'20046,559,485'Semiconductor device having a gate insulation film resistant to dielectric breakdown'20036,376,388'Dry etching with reduced damage to MOS device'20026,044,850'Semiconductor device manufacturing method including ashing process'20005,837,334'Large sized quartz glass tube, large scale quartz glass preform, process for manufacturing the same and quartz glass optical fiber'19985,785,729'Method for manufacturing large-sized quartz glass tube'19985,780,257'Method and reagent for detecting peroxidase or hydrogen peroxide'19985,651,827'Single-wafer heat-treatment apparatus and method of manufacturing reactor vessel used for same'19975,559,582'Exposure apparatus'19965,452,119'Scanning optical system'19955,324,012'Holding apparatus for holding an article such as a semiconductor wafer'19945,299,050'Scanning optical system'19945,218,461'Scanning optical apparatus'19935,194,743'Device for positioning circular semiconductor wafers'19934,956,208'Manufacture of a quartz glass vessel for the growth of single crystal semiconductor'19904,935,046'Manufacture of a quartz glass vessel for the growth of single crystal semiconductor'19904,900,939'System for processing and conveying substrate'19904,696,905'Method for diagnosing cancer using ESR'19874,650,335'Comparison type dimension measuring method and apparatus using a laser beam in a microscope system'19874,625,103'Automatic focusing device in microscope system'1986

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1986–1995Patents assigned to ASAHI OPTICAL CO LTD (5)· patent assignee history
1986–1995Based in Tokyo, JP· patent location history
1990–2004Patents assigned to NIKON CORP (6)· patent assignee history
1990–1998Patents assigned to SHINETSU QUARTZ PROD (5)· patent assignee history
1994–2004Based in Kanagawa, JP· patent location history
1996–2004Based in Chigasaki, JP· patent location history
1997–1998Patents assigned to HERAEUS QUARZGLAS (3)· patent assignee history
1998–2004Based in Yamagata, JP· patent location history
2000–2003Patents assigned to FUJITSU LTD (3)· patent assignee history
2002–2005Based in Kasugai, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NIKON CORP61990–2004
ASAHI OPTICAL CO LTD51986–1995
SHINETSU QUARTZ PROD51990–1998
FUJITSU LTD32000–2003
HERAEUS QUARZGLAS31997–1998
Locations
LocationPatentsSpan
Tokyo, JP61986–1995
Kasugai, JP32002–2005
Yamagata, JP21998–2004
Chigasaki, JP21996–2004
Kanagawa, JP21994–2004