Inventor

Eva Tois

Inventor
Espoo, FI

Overview

33→
Patents
2010–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 33 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material24%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1023%
H01LSemiconductor devices20%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1017%
H10DInorganic electric semiconductor devices9%
B05DProcesses for applying fluent materials to surfaces, in general4%
C30BSingle-crystal growth3%
C09DCoating compositions, e.g. paints, varnishes or lacquers1%
PatentTitleYear
11,094,535Selective passivation and selective deposition202111,081,342Selective deposition using hydrophobic precursors202111,047,040Dual selective deposition202110,991,573Uniform deposition of SiOC on dielectric and metal surfaces202110,964,534Enhanced thin film deposition202110,923,361Deposition of organic films202110,900,120Passivation against vapor deposition202110,872,765Selective layer formation using deposition and removing202010,854,460Deposition of organic films202010,612,137Organic reactants for atomic layer deposition202010,553,440Methods for depositing nickel films and for making nickel silicide and nickel germanide202010,513,772Process for passivating dielectric films201910,456,808Selective deposition of metals, metal oxides, and dielectrics201910,453,701Deposition of organic films201910,443,123Dual selective deposition201910,373,820Deposition of organic films201910,297,444Enhanced thin film deposition201910,204,790Methods for thin film deposition201910,047,435Dual selective deposition201810,043,880Metal silicide, metal germanide, methods for making the same20189,895,715'Selective deposition of metals, metal oxides, and dielectrics'20189,831,094Enhanced thin film deposition20179,816,180'Selective deposition'20179,634,106'Doped metal germanide and methods for making the same'20179,514,956'Method of growing oxide thin films'20169,379,011'Methods for depositing nickel films and for making nickel silicide and nickel germanide'20169,127,351'Enhanced thin film deposition'20159,129,897'Metal silicide, metal germanide, methods for making the same'20158,993,055'Enhanced thin film deposition'20158,871,617'Deposition and reduction of mixed metal oxide thin films'20147,824,492'Method of growing oxide thin films'20107,771,533'Atomic-layer-chemical-vapor-deposition of films that contain silicon dioxide'20107,771,534'Method of growing oxide thin films'2010

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2010–2021Patents assigned to ASM INT (8)· patent assignee history
2010–2021Based in Espoo, FI· patent location history
2014–2021Patents assigned to ASM IP HOLDING BV (18)· patent assignee history
2014–2016Patents assigned to PORE VILJAMI J (3)· patent assignee history
2014–2021Based in Helsinki, FI· patent location history
2015–2019Patents assigned to BLOMBERG TOM E (3)· patent assignee history
2016–2021Patents assigned to ASM INT NV (8)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASM IP HOLDING BV182014–2021
ASM INT82010–2021
ASM INT NV82016–2021
BLOMBERG TOM E32015–2019
PORE VILJAMI J32014–2016
Locations
LocationPatentsSpan
Espoo, FI192010–2021
Helsinki, FI142014–2021