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Inventor

Tomotaka Shinoda

Inventor
Tokyo, JP

Overview

15→
Patents
2000–2019
Patent span
Chemistry
Primary field (CPC C)

Patents· 15 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds8%
B24BMachines, devices, or processes for grinding or polishing6%
C08LCompositions of macromolecular compounds6%
C09DCoating compositions, e.g. paints, varnishes or lacquers6%
C09GPolishing compositions6%
C09KMaterials for miscellaneous applications, not provided for elsewhere6%
H04NPictorial communication, e.g. television6%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients4%
C11DDetergent compositions4%
PatentTitleYear
10,319,605Semiconductor treatment composition and treatment method201910,304,694Semiconductor treatment composition and treatment method201910,199,651Binder composition for electrode of electric storage device20199,509,911'Image-capturing device, and image combination program'20168,988,544'High dynamic range imaging device and image synthesis program'20158,849,024'Image processing device and medium storing image processing program'20148,652,350'Chemical mechanical polishing aqueous dispersion, chemical mechanical polishing method using the same, and method of recycling chemical mechanical polishing aqueous dispersion'20148,406,514'Image processing device and recording medium storing image processing program'20138,247,289'Capacitor and manufacturing method thereof'20127,742,277'Dielectric film capacitor and method of manufacturing the same'20107,432,486'Microscope image acquiring system with separate microscope and imaging instrument controllers that operate cooperatively'20087,253,385'Microscope image acquiring system with separate microscope and imaging instrument controllers that operate cooperatively'20076,313,233'Curable resin composition cured products'20016,235,101'Composition for film formation and film'20016,011,123'Curable resin composition and cured products'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2019Patents assigned to JSR CORP (7)· patent assignee history
2000–2001Based in Tsuchiura, JP· patent location history
2007–2016Patents assigned to NIKON CORP (6)· patent assignee history
2007–2014Based in Kita-ku, JP· patent location history
2010–2016Based in Tokyo, JP· patent location history
2012–2016Patents assigned to SHINODA TOMOTAKA (6)· patent assignee history
2013–2014Patents assigned to ITO HIDEKI (2)· patent assignee history
2013–2014Patents assigned to MITAKA TOSHIHIRO (2)· patent assignee history
2014–2019Based in Koto-ku, JP· patent location history
2019Based in Minato-ku, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
JSR CORP72000–2019
NIKON CORP62007–2016
SHINODA TOMOTAKAself62012–2016
ITO HIDEKI22013–2014
MITAKA TOSHIHIRO22013–2014
Locations
LocationPatentsSpan
Tokyo, JP52010–2016
Kita-ku, JP32007–2014
Minato-ku, JP22019
Koto-ku, JP22014–2019
Tsuchiura, JP22000–2001