Inventor
Ralph Klaesges
Inventor
Aalen, DE
Overview
Patents· 3 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices60%
C03CChemical composition of glasses, glazes or vitreous enamels20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
PatentTitleYear
9,034,539'Controllable transmission and phase compensation of transparent material'20158,735,030'Method and apparatus for modifying a substrate surface of a photolithographic mask'20147,019,824'Moire method and measuring system for measuring the distortion of an optical imaging system'2006Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2006–2015Based in Aalen, DE· patent location history
2014–2015Patents assigned to KLAESGES RALPH (2)· patent assignee history
2014–2015Patents assigned to MENGEL MARKUS (2)· patent assignee history
2014–2015Patents assigned to OSHEMKOV SERGEY (2)· patent assignee history
2014–2015Patents assigned to ZEISS CARL SMS GMBH (2)· patent assignee history
2014–2015Patents assigned to ZEISS CARL SMS LTD (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KLAESGES RALPHself | 2 | 2014–2015 |
| MENGEL MARKUS | 2 | 2014–2015 |
| OSHEMKOV SERGEY | 2 | 2014–2015 |
| ZEISS CARL SMS GMBH | 2 | 2014–2015 |
| ZEISS CARL SMS LTD | 2 | 2014–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Aalen, DE | 3 | 2006–2015 |