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Inventor

Masaki Uchikura

Inventor
Sagamihara, JP

Overview

3→
Patents
1988–1992
Patent span
Performing operations
Primary field (CPC B)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B01Dprimary
B01DSeparation40%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds20%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds20%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
PatentTitleYear
5,100,957'Protective dust cover for photomask or reticle'19924,755,561'Poly(disubstituted acetylene)/polyorganosiloxane graft copolymer and membrane for gas separation'19884,746,334'Poly(disubstituted acetylene)/polyorganosiloxane graftcopolymer and membrane for gas separation'1988

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1988–1992Patents assigned to TOSOH CORP (3)· patent assignee history
1988Patents assigned to SAGAMI CHEM RES (2)· patent assignee history
1988–1992Based in Sagamihara, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOSOH CORP31988–1992
SAGAMI CHEM RES21988
Locations
LocationPatentsSpan
Sagamihara, JP31988–1992