Inventor

Yaojin Lin

Inventor

Shenzhen, CN

Overview

2012–2021

Patent span

Physics

Primary field (CPC G)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G02Bprimary

G02BOptical elements, systems or apparatus11%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices11%

G03HHolographic processes or apparatus11%

G06FElectric digital data processing11%

H01LSemiconductor devices11%

H02MApparatus for conversion between ac and ac, between ac and dc, or between dc and dc, and for use with mains or similar power supply systems11%

H10KOrganic electric solid-state devices11%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1011%

Y02BClimate change mitigation technologies related to buildings, e.g. housing, house appliances or related end-user applications11%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2012Patents assigned to LIN YAOJIN (1)· patent assignee history

2012Patents assigned to MARIMUTHU PANDI CHELVAM (1)· patent assignee history

2012Patents assigned to STATS CHIPPAC LTD (1)· patent assignee history

2012Based in Singapore, SG· patent location history

2021Patents assigned to HUAWEI TECH CO LTD (1)· patent assignee history

2021Patents assigned to UNIV NORTH TEXAS (1)· patent assignee history

2021Based in Shenzhen, CN· patent location history

2021Based in Lantana, TX, US· patent location history

Assignee and location history derived from the patent record.

Assignees

Locations