Inventor

CHUNG-HSUN LI

Inventor
NL

Overview

5→
Patents
2023–2025
Patent span
Physics
Primary field (CPC G)

Patents· 5 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices29%
G05BControl or regulating systems in general18%
Y02PClimate change mitigation technologies in the production or processing of goods18%
G06FElectric digital data processing12%
G01BMeasuring length, thickness or similar linear dimensions6%
G01NInvestigating or analysing materials by determining their chemical or physical properties6%
H01LSemiconductor devices6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2023–2025Patents assigned to ASML NETHERLANDS BV (5)· patent assignee history
2023–2025Based in NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV52023–2025
Locations
LocationPatentsSpan
NL52023–2025