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Inventor

Takanori Koizumi

Inventor
Tokyo, JP

Overview

2→
Patents
2018–2020
Patent span
Chemistry
Primary field (CPC C)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C08Gprimary
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds40%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%
C08LCompositions of macromolecular compounds20%
PatentTitleYear
10,782,612Polysulfone amide compound, and resin composition containing same20209,857,685'Photosensitive resin composition, resist laminate, cured product of photosensitive resin composition, and cured product of resist laminate (11)'2018

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2018–2020Patents assigned to NIPPON KAYAKU KK (2)· patent assignee history
2018–2020Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NIPPON KAYAKU KK22018–2020
Locations
LocationPatentsSpan
Tokyo, JP22018–2020