Inventor
Takashi Fuse
Inventor
Tokyo, JP
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
H01JElectric discharge tubes or discharge lamps18%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1011%
B82YSpecific uses or applications of nanostructures7%
G01BMeasuring length, thickness or similar linear dimensions7%
Y10TTechnical subjects covered by former us classification7%
G01NInvestigating or analysing materials by determining their chemical or physical properties4%
G06TImage data processing or generation, in general4%
B41JTypewriters2%
C03CChemical composition of glasses, glazes or vitreous enamels2%
PatentTitleYear
10,664,964Abnormal detection apparatus and method202010,600,621Plasma electrode and plasma processing device202010,467,745Abnormality detection device, abnormality detection method and non-transitory computer-readable recording medium20199,099,298'Substrate cleaning apparatus and substrate cleaning method'20157,554,095'Static electricity deflecting device, electron beam irradiating apparatus, substrate processing apparatus, substrate processing method, and method of manufacturing substrate'20097,550,739'Static electricity deflecting device, electron beam irradiating apparatus, substrate processing apparatus, substrate processing method and method of manufacturing substrate'20097,521,687'Static electricity deflecting device, electron beam irradiating apparatus, substrate processing apparatus, substrate processing method and method of manufacturing substrate'20097,507,673'Method for etching an object to be processed'20097,473,377'Plasma processing method'20097,443,516'Optical-distortion correcting apparatus and optical-distortion correcting method'20087,432,207'Method for etching object to be processed'20087,381,653'Plasma processing method'20087,141,510'Plasma processing method'20066,914,010'Plasma etching method'20056,555,836'Method and apparatus for inspecting bumps and determining height from a regular reflection region'20036,104,493'Method and apparatus for visual inspection of bump array'20006,052,189'Height measurement device and height measurement method'20005,999,266'Method for inspecting height, and a height inspection apparatus to carry out the method'19995,430,468'Image recording apparatus'1995Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1995Patents assigned to CANON KK (1)· patent assignee history
1999–2020Patents assigned to FUJITSU LTD (7)· patent assignee history
1999–2008Based in Kawasaki, JP· patent location history
2005–2020Patents assigned to TOKYO ELECTRON LTD (11)· patent assignee history
2005–2009Based in Tokyo, JP· patent location history
2008–2020Based in Nirasaki, JP· patent location history
2015Patents assigned to DOBASHI KAZUYA (1)· patent assignee history
2015Patents assigned to FUSE TAKASHI (1)· patent assignee history
2015Based in Fremont, CA, US· patent location history
2019–2020Based in Hadano, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 11 | 2005–2020 |
| FUJITSU LTD | 7 | 1999–2020 |
| CANON KK | 1 | 1995 |
| DOBASHI KAZUYA | 1 | 2015 |
| FUSE TAKASHIself | 1 | 2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 5 | 2005–2009 |
| Kawasaki, JP | 5 | 1999–2008 |
| Nirasaki, JP | 4 | 2008–2020 |
| Hadano, JP | 2 | 2019–2020 |
| Fremont, California, US | 1 | 2015 |