Inventor
Andreas Boettcher
Inventor
Nussloch, DE
Overview
Patents· 28 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests19%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds9%
C07CAcyclic or carbocyclic compounds8%
C09DCoating compositions, e.g. paints, varnishes or lacquers8%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds5%
C09JAdhesives5%
A01NPreservation of bodies of humans or animals or plants or parts thereof4%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients4%
C08LCompositions of macromolecular compounds4%
PatentTitleYear
9,951,205Stable compositions of thiabendazole and iodine-containing fungicides20189,326,502'Stabilization of compounds containing iodine having polymers comprising nitrogen'20169,296,878'Fungicide formulations for plasticized PVC'20169,004,846'Gripper assembly for moving device'20155,389,699'(Meth)acrylate copolymer based UV-crosslinkable materials'19955,314,936'Aqueous polymer dispersions containing organic compounds having carbonate groups and carbonyl groups and paints and coating systems produced therewith'19945,294,688'UV-crosslinkable copolymers'19945,292,915'Compounds containing carbonate groups and carbonyl groups and the preparation and use thereof'19945,264,533'Benzophenone derivatives and their preparation'19935,248,805'Radiation-senstive, ethylenically unsaturated, copolymerizable compounds and their preparation'19935,220,037'Sulfonium salts and use thereof'19935,206,417'Radiation-sensitive, ethylenically unsaturated copolymerizable compounds and their preparation'19935,191,124'Sulfonium salts having acid-labile groups'19935,180,756'Agents curable by ultraviolet radiation'19935,130,392'Radiation-sensitive polymers'19925,101,053'Radiation-sensitive, ethylenically unsaturated, copolymerizable sulfonium salts and their preparation'19925,073,611'Copolymers crosslinkable by ultraviolet radiation in the atmosphere'19915,073,474'Radiation-sensitive mixture containing acid labile groups and production of relief patterns'19915,069,998'Radiation sensitive mixture and production of relief patterns'19915,026,806'UV-crosslinkable materials based on isoamyl (meth)acrylate copolymers'19914,967,010'Preparation of symmetric and asymmetric monoacetals of aromatic 1,2-diketones'19904,962,011'Photopolymerizable recording materials containing a triazole sensitizer and photoresist layers and lithographic printing plates based thereon'19904,940,649'Photopolymerizable recording materials and photoresist layers and lithographic printing plates based thereon'19904,908,448'4-Quinazolone compounds'19904,891,301'Photopolymerizable recording materials, photoresist layers and lithographic printing plates based theron, and novel 4-quinazolone compounds'19904,886,735'Photopolymerizable recording materials and photoresist layers and lithographic printing plates based thereon'19894,883,740'Radiation-sensitive mixture for photosensitive coating materials'19894,868,091'Photopolymerizable recording material, in particular for the production of printing plates and relief plates'1989Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1989–1995Patents assigned to BASF AG (23)· patent assignee history
1989–1995Based in Nussloch, DE· patent location history
1989–1990Based in Leimen, DE· patent location history
1993–2015Patents assigned to BOETTCHER ANDREAS (2)· patent assignee history
2015Patents assigned to CHIU JIA-WEI (1)· patent assignee history
2015Patents assigned to LA ROVERE STEFANO (1)· patent assignee history
2015Based in Wallduern, DE· patent location history
2016–2018Patents assigned to LANXESS DEUTSCHLAND GMBH (3)· patent assignee history
2016–2018Based in Cologne, DE· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| BASF AG | 23 | 1989–1995 |
| LANXESS DEUTSCHLAND GMBH | 3 | 2016–2018 |
| BOETTCHER ANDREASself | 2 | 1993–2015 |
| CHIU JIA-WEI | 1 | 2015 |
| LA ROVERE STEFANO | 1 | 2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Nussloch, DE | 18 | 1989–1995 |
| Leimen, DE | 6 | 1989–1990 |
| Cologne, DE | 3 | 2016–2018 |
| Wallduern, DE | 1 | 2015 |