Inventor
Gerben Pieterse
Inventor
Eindhoven, NL
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices44%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
H01LSemiconductor devices16%
H05BElectric heating6%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h106%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry3%
PatentTitleYear
11,048,178Lithographic apparatus with improved patterning performance202110,916,453Lithographic apparatus, method of transferring a substrate and device manufacturing method202110,908,517Setpoint generator, lithographic apparatus, lithographic apparatus operating method, and device manufacturing method202110,627,721Lithography apparatus, and a method of manufacturing a device202010,520,837Lithographic apparatus, support table for a lithographic apparatus and device manufacturing method201910,481,502Object holder and lithographic apparatus201910,409,174Lithographic apparatus, method of transferring a substrate and device manufacturing method201910,324,384Lithographic apparatus and a method of manufacturing a lithographic apparatus201910,095,129Lithographic apparatus and a method of manufacturing a device using a lithographic apparatus20189,915,877'Object holder and lithographic apparatus'20189,904,177'Fluid handling structure, a lithographic apparatus and a device manufacturing method'20189,897,928'Lithographic apparatus, support table for a lithographic apparatus and device manufacturing method'20189,785,055'Object holder and lithographic apparatus'20179,044,725'Effective droplet drying'20158,675,169'Gas manifold, module for a lithographic apparatus, lithographic apparatus and device manufacturing method'2014Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2014–2021Patents assigned to ASML NETHERLANDS BV (14)· patent assignee history
2014–2018Patents assigned to PIETERSE GERBEN (4)· patent assignee history
2014–2018Patents assigned to VAN DER HAM RONALD (3)· patent assignee history
2014–2021Based in Eindhoven, NL· patent location history
2018Patents assigned to BLOKS RUUD HENDRIKUS MARTINUS JOHANNES (2)· patent assignee history
2018Patents assigned to CORCORAN GREGORY MARTIN MASON (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 14 | 2014–2021 |
| PIETERSE GERBENself | 4 | 2014–2018 |
| VAN DER HAM RONALD | 3 | 2014–2018 |
| BLOKS RUUD HENDRIKUS MARTINUS JOHANNES | 2 | 2018 |
| CORCORAN GREGORY MARTIN MASON | 2 | 2018 |
Locations
| Location | Patents | Span |
|---|---|---|
| Eindhoven, NL | 15 | 2014–2021 |