Inventor
Paul Mertens
Inventor
Bonheiden, BE
Overview
Patents· 35 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1034%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests19%
B08BCleaning in general5%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices5%
C11DDetergent compositions4%
H10DInorganic electric semiconductor devices4%
B02CCrushing, pulverising, or disintegrating in general2%
C23CCoating metallic material2%
C30BSingle-crystal growth2%
F26BDrying solid materials or objects by removing liquid therefrom2%
PatentTitleYear
10,988,719Method for producing beers stored, offered, served or consumed in UV-VIS-transmittant bottles with reduced sensitivity, in particular no sensitivity, to skunky thiol flavor degradation upon exposure to sunlight or other sources of UV and/or VIS light, and beers stored, offered, served or consumed in UV-VIS-transmittant bottles with reduced sensitivity, in particular no sensitivity, to skunky thiol flavor degradation upon exposure to sunlight or other sources of UV and/or VIS light20219,673,373'System for delivering ultrasonic energy to a liquid and use for cleaning of solid parts'20179,378,989'Method and apparatus for cleaning semiconductor substrates'20168,324,116'Substrate treating method and method of manufacturing semiconductor device using the same'20128,197,604'Method and apparatus for controlling optimal operation of acoustic cleaning'20127,867,565'Method for coating substrates'20117,527,698'Method and apparatus for removing a liquid from a surface of a substrate'20097,521,408'Semiconductor cleaning solution'20097,224,433'Method and apparatus for immersion lithography'20077,160,482'Composition comprising an oxidizing and complexing compound'20077,100,304'Megasonic cleaner and dryer'20066,928,751'Megasonic cleaner and dryer system'20056,910,487'Method and apparatus for liquid-treating and drying a substrate'20056,863,795'Multi-step method for metal deposition'20056,851,435'Method and apparatus for localized liquid treatment of the surface of a substrate'20056,821,349'Method and apparatus for removing a liquid from a surface'20046,754,980'Megasonic cleaner and dryer'20046,676,765'Method of removing particles and a liquid from a surface of substrate'20046,632,751'Method and apparatus for liquid-treating and drying a substrate'20036,592,676'Chemical solution and method for reducing the metal contamination on the surface of a semiconductor substrate'20036,568,408'Method and apparatus for removing a liquid from a surface of a rotating substrate'20036,551,409'Method for removing organic contaminants from a semiconductor surface'20036,530,385'Apparatus and method for wet cleaning or etching a flat substrate'20036,491,764'Method and apparatus for removing a liquid from a surface of a rotating substrate'20026,472,294'Semiconductor processing method for processing discrete pieces of substrate to form electronic devices'20026,398,975'Method and apparatus for localized liquid treatment of the surface of a substrate'20026,387,827'Method for growing thin silicon oxides on a silicon substrate using chlorine precursors'20026,334,902'Method and apparatus for removing a liquid from a surface'20026,322,598'Semiconductor processing system for processing discrete pieces of substrate to form electronic devices'20016,303,522'Oxidation in an ambient comprising ozone and the reaction products of an organic chloro-carbon precursor'20016,261,377'Method of removing particles and a liquid from a surface of substrate'20016,247,481'Apparatus and method for wet cleaning or etching a flat substrate'20015,712,168'Method for evaluating, monitoring or controlling the efficiency, stability, or exhaustion of a complexing or chelating agent present in a chemical solution used for oxidizing, dissolving, etching or stripping a semiconductor wafer'19984,161,295'Blower beater mill'19794,161,293'Blower beater mill'1979Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1979Based in Mulheim, DE· patent location history
1998–2017Patents assigned to IMEC (6)· patent assignee history
2001–2009Patents assigned to IMEC INTER UNI MICRO ELECTR (17)· patent assignee history
2001–2005Patents assigned to IMEC VZW (5)· patent assignee history
2001–2017Based in Bonheiden, BE· patent location history
2001–2004Based in Haacht, BE· patent location history
2003Based in Hococht, BE· patent location history
2007–2009Patents assigned to AIR PROD & CHEM (2)· patent assignee history
2012–2016Patents assigned to MERTENS PAUL (3)· patent assignee history
2021Based in Roosdaal, BE· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IMEC INTER UNI MICRO ELECTR | 17 | 2001–2009 |
| IMEC | 6 | 1998–2017 |
| IMEC VZW | 5 | 2001–2005 |
| MERTENS PAULself | 3 | 2012–2016 |
| AIR PROD & CHEM | 2 | 2007–2009 |
Locations
| Location | Patents | Span |
|---|---|---|
| Bonheiden, BE | 18 | 2001–2017 |
| Haacht, BE | 12 | 2001–2004 |
| Mulheim, DE | 2 | 1979 |
| Roosdaal, BE | 1 | 2021 |
| Hococht, BE | 1 | 2003 |