LexDanaLexDanabeta
Inventor

KEIJI HIRABAYASHI

Inventor
JP

Overview

3→
Patents
2023–2025
Patent span
Electricity
Primary field (CPC H)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices27%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1027%
C23CCoating metallic material18%
H01LSemiconductor devices18%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form9%
PatentTitleYear
12,411,426Substrate holding board, manufacturing method of device, and exposure device202512,400,906Wafer chuck, method for producing the same, and exposure apparatus202511,842,918Wafer chuck, method for producing the same, and exposure apparatus2023

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2023–2025Patents assigned to CANON KK (3)· patent assignee history
2023–2025Based in JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CANON KK32023–2025
Locations
LocationPatentsSpan
JP32023–2025