Inventor
KAZUHIRO HAMAMOTO
Inventor
JP
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices60%
G02BOptical elements, systems or apparatus20%
G21KHandling of particles or ionising radiation not otherwise provided for20%
PatentTitleYear
12,025,911Reflective structure, reflective mask blank, reflective mask and method of manufacturing semiconductor device202411,899,356Reflective film coated substrate, mask blank, reflective mask, and semiconductor device manufacturing method202411,681,214Substrate with a multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing semiconductor device202311,500,281Reflective film coated substrate, mask blank, reflective mask, and semiconductor device manufacturing method202211,281,090Substrate with a multilayer reflective film, reflective mask blank, reflective mask, and method of manufacturing semiconductor device202211,262,647Substrate with multilayer reflective film, reflective mask blank, reflective mask, and semiconductor device manufacturing method2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2024Patents assigned to HOYA CORP (6)· patent assignee history
2022–2024Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HOYA CORP | 6 | 2022–2024 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 6 | 2022–2024 |