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Inventor

Ryozo Takihana

Inventor
Kawagoe, JP

Overview

4→
Patents
2014–2015
Patent span
Chemistry
Primary field (CPC C)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C07Cprimary
C07CAcyclic or carbocyclic compounds36%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices27%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds18%
C07DHeterocyclic compounds9%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests9%
PatentTitleYear
9,221,928'Fluorine-containing sulfonate resin, fluorine-containing N-sulfonyloxyimide resin, resist composition and pattern formation method'20159,182,664'Polymerizable fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern-forming method using same'20158,993,212'Fluorine-containing sulfonic acid salts, photo-acid generator and resist composition and pattern formation method utilizing same'20158,846,966'Method for producing alkoxycarbonylfluoroalkanesulfonic acid salt'2014

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2014–2015Patents assigned to CENTRAL GLASS CO LTD (4)· patent assignee history
2014–2015Patents assigned to NARIZUKA SATORU (4)· patent assignee history
2014–2015Patents assigned to TAKIHANA RYOZO (4)· patent assignee history
2014–2015Patents assigned to ISONO YOSHIMI (2)· patent assignee history
2014Patents assigned to FUSHIMI MASANORI (1)· patent assignee history
2014–2015Based in Kawagoe, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CENTRAL GLASS CO LTD42014–2015
NARIZUKA SATORU42014–2015
TAKIHANA RYOZOself42014–2015
ISONO YOSHIMI22014–2015
FUSHIMI MASANORI12014
Locations
LocationPatentsSpan
Kawagoe, JP42014–2015