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Inventor

Laurentius Cornelius De Winter

Inventor
Vessem, NL

Overview

18→
Patents
2003–2020
Patent span
Physics
Primary field (CPC G)

Patents· 18 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices55%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them16%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%
G02BOptical elements, systems or apparatus6%
B21DWorking or processing of sheet metal or metal tubes, rods or profiles without essentially removing material3%
B60RVehicles, vehicle fittings, or vehicle parts, not otherwise provided for3%
B62DMotor vehicles3%
F16FSprings3%
PatentTitleYear
10,732,498Patterning device202010,401,723Patterning device201910,331,042Method for a lithographic apparatus201910,139,725Lithographic apparatus20189,690,210'Lithographic apparatus and device manufacturing method'20179,535,341'Method for a lithographic apparatus'20179,280,064'Lithographic method and apparatus'20168,780,325'Method for a lithographic apparatus'20148,717,540'Calculating a laser metric within a lithographic apparatus and method thereof'20148,426,088'Method for a lithographic apparatus'20138,300,212'Device manufacturing method and lithographic apparatus'20128,237,913'Lithographic apparatus and method'20128,178,263'Method for a lithographic apparatus'20128,134,683'Device manufacturing method, computer program and lithographic apparatus'20127,456,931'Device manufacturing method, computer program product and lithographic apparatus'20087,352,443'Radially polarized light in lithographic apparatus'20087,307,690'Device manufacturing method, computer program product and lithographic apparatus'20076,598,442'Production of a component for reducing the effects of an external mechanical impact, and the component produced in this way'2003

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2003Based in Hillegom, NL· patent location history
2007–2020Patents assigned to ASML NETHERLANDS BV (17)· patent assignee history
2007–2020Based in Vessem, NL· patent location history
2012–2017Patents assigned to DE WINTER LAURENTIUS CORNELIUS (10)· patent assignee history
2012–2017Patents assigned to FINDERS JOZEF MARIA (5)· patent assignee history
2014–2016Patents assigned to KÖHLER CARSTEN ANDREAS (2)· patent assignee history
2014–2016Patents assigned to STAALS FRANK (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV172007–2020
DE WINTER LAURENTIUS CORNELIUSself102012–2017
FINDERS JOZEF MARIA52012–2017
KÖHLER CARSTEN ANDREAS22014–2016
STAALS FRANK22014–2016
Locations
LocationPatentsSpan
Vessem, NL172007–2020
Hillegom, NL12003