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Inventor

Katsuyoshi Kojima

Inventor
Tokyo, JP

Overview

5→
Patents
2003–2018
Patent span
Electricity
Primary field (CPC H)

Patents· 5 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B24Bprimary
B24BMachines, devices, or processes for grinding or polishing33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
C09GPolishing compositions8%
C09KMaterials for miscellaneous applications, not provided for elsewhere8%
G01NInvestigating or analysing materials by determining their chemical or physical properties8%
H01LSemiconductor devices8%
H10DInorganic electric semiconductor devices8%
PatentTitleYear
9,994,739Polishing liquid and method of polishing SiC substrate20189,761,454'Method of polishing SiC substrate'20176,976,908'Polishing head and polishing apparatus'20056,668,662'Viscoelasticity measuring device'20036,517,422'Polishing apparatus and method thereof'2003

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2003–2005Patents assigned to TOSHIBA CERAMICS CO (3)· patent assignee history
2003–2005Based in Shibata, JP· patent location history
2003Based in Niigata, JP· patent location history
2017–2018Patents assigned to DISCO CORP (2)· patent assignee history
2017–2018Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOSHIBA CERAMICS CO32003–2005
DISCO CORP22017–2018
Locations
LocationPatentsSpan
Tokyo, JP22017–2018
Shibata, JP22003–2005
Niigata, JP12003