Inventor
Yasushi Hayashida
Inventor
Koshi, JP
Overview
Patents· 31 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1044%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
G05BControl or regulating systems in general6%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
Y10TTechnical subjects covered by former us classification6%
B05CApparatus for applying fluent materials to surfaces, in general3%
B62DMotor vehicles3%
F16HGearing3%
Y02PClimate change mitigation technologies in the production or processing of goods3%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein2%
PatentTitleYear
8,863,373'Apparatus and method of application and development'20148,408,158'Coating/developing device and method'20138,377,501'Coating and developing system control method of controlling coating and developing system'20138,313,257'Coating and developing apparatus, substrate processing method, and storage medium'20128,302,556'Coating and developing apparatus'20128,206,076'Substrate processing system'20128,057,114'Wet-processing apparatus, wet-processing method and storage medium'20118,025,023'Coating and developing system, coating and developing method and storage medium'20117,997,813'Coating and developing system with a direct carrying device in a processing block, coating and developing method and storage medium'20117,955,011'Coating and developing apparatus, substrate processing method, and storage medium'20117,880,859'Substrate processing system and substrate processing method'20117,871,211'Coating and developing system, coating and developing method and storage medium'20117,841,072'Apparatus and method of application and development'20107,793,609'Coating and developing apparatus'20107,789,577'Coating and developing system, coating and developing method and storage medium'20107,729,798'Substrate processing system, and method of control therefor, control program, and storage medium'20107,678,417'Coating method and coating apparatus'20107,645,713'Substrate processing system and substrate processing method'20107,597,492'Coating and developing system, coating and developing method and storage medium'20097,591,601'Coater/developer, coating/developing method, and storage medium'20097,474,377'Coating and developing system'20097,403,260'Coating and developing system'20087,322,756'Coating and developing apparatus and coating and developing method'20087,281,869'Coating and developing system and coating and developing method'20077,267,497'Coating and developing system and coating and developing method'20077,262,829'Coating and developing apparatus and coating and developing method'20077,245,348'Coating and developing system and coating and developing method with antireflection film and an auxiliary block for inspection and cleaning'20077,241,061'Coating and developing system and coating and developing method'20075,724,857'Steering gear apparatus of rack-and-pinion type'19985,596,904'Steering gear apparatus of rack-and-pinion type'19975,028,955'Exposure apparatus'1991Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1991–2014Patents assigned to TOKYO ELECTRON LTD (29)· patent assignee history
1997–1998Based in Nishikamo-gun, JP· patent location history
2007–2009Based in Suwa, JP· patent location history
2007–2010Based in Kumamoto, JP· patent location history
2009–2014Based in Koshi, JP· patent location history
2011–2014Patents assigned to HAYASHIDA YASUSHI (7)· patent assignee history
2011–2014Patents assigned to HARA YOSHITAKA (3)· patent assignee history
2012–2014Patents assigned to HAYASHI SHINICHI (4)· patent assignee history
2012–2014Patents assigned to MATSUOKA NOBUAKI (4)· patent assignee history
2013Based in Kikuchi-gun, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 29 | 1991–2014 |
| HAYASHIDA YASUSHIself | 7 | 2011–2014 |
| HAYASHI SHINICHI | 4 | 2012–2014 |
| MATSUOKA NOBUAKI | 4 | 2012–2014 |
| HARA YOSHITAKA | 3 | 2011–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Koshi, JP | 17 | 2009–2014 |
| Suwa, JP | 6 | 2007–2009 |
| Kumamoto, JP | 4 | 2007–2010 |
| Nishikamo-gun, JP | 2 | 1997–1998 |
| Kikuchi-gun, JP | 1 | 2013 |