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Inventor

Michael G. Chafin

Inventor
Santa Clara, CA, US

Overview

14→
Patents
1997–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 14 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1031%
H01JElectric discharge tubes or discharge lamps29%
H01LSemiconductor devices9%
C23CCoating metallic material6%
H02NElectric machines not otherwise provided for6%
Y10TTechnical subjects covered by former us classification6%
B01DSeparation3%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry3%
H01RElectrically-conductive connections3%
H03HImpedance networks, e.g. resonant circuits3%
PatentTitleYear
10,840,062Radio frequency filter system for a processing chamber202010,546,731Method, apparatus and system for wafer dechucking using dynamic voltage sweeping20209,601,301'Non-intrusive measurement of a wafer DC self-bias in semiconductor processing equipment'20179,070,536'Plasma reactor electrostatic chuck with cooled process ring and heated workpiece support surface'20158,580,693'Temperature enhanced electrostatic chucking in plasma processing apparatus'20138,270,141'Electrostatic chuck with reduced arcing'20127,838,430'Plasma control using dual cathode frequency mixing'20107,813,103'Time-based wafer de-chucking from an electrostatic chuck having separate RF BIAS and DC chucking electrodes'20106,824,748'Heated catalytic treatment of an effluent gas from a substrate fabrication process'20046,273,958'Substrate support for plasma processing'20016,151,203'Connectors for an electrostatic chuck and combination thereof'20006,095,084'High density plasma process chamber'20005,903,428'Hybrid Johnsen-Rahbek electrostatic chuck having highly resistive mesas separating the chuck from a wafer supported thereupon and method of fabricating same'19995,636,098'Barrier seal for electrostatic chuck'1997

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1997–2020Patents assigned to APPLIED MATERIALS INC (14)· patent assignee history
1997Based in Underhill, VT, US· patent location history
1999–2004Based in San Jose, CA, US· patent location history
2010–2020Based in Santa Clara, CA, US· patent location history
2012–2013Patents assigned to CHAFIN MICHAEL G (2)· patent assignee history
2012–2013Patents assigned to PALAGASHVILI DAVID (2)· patent assignee history
2012Patents assigned to BUCHBERGER JR DOUGLAS A (1)· patent assignee history
2013Patents assigned to BELOSTOTSKIY SERGEY G (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
APPLIED MATERIALS INC141997–2020
CHAFIN MICHAEL Gself22012–2013
PALAGASHVILI DAVID22012–2013
BELOSTOTSKIY SERGEY G12013
BUCHBERGER JR DOUGLAS A12012
Locations
LocationPatentsSpan
Santa Clara, California, US82010–2020
San Jose, California, US51999–2004
Underhill, VT, US11997