Inventor
Ezra Robert Gold
Inventor
Sunnyvale, CA, US
Overview
Patents· 25 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1024%
H01JElectric discharge tubes or discharge lamps23%
Y10TTechnical subjects covered by former us classification15%
H05BElectric heating6%
H01LSemiconductor devices5%
H04NPictorial communication, e.g. television5%
F17DPipe-line systems3%
G01FMeasuring volume, volume flow, mass flow or liquid level3%
H05HPlasma technique3%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%
PatentTitleYear
9,848,474Lighting nodes having a core node and sensor pods20179,587,789'Methods and apparatus for providing a gas mixture to a pair of process chambers'20179,565,732'Lighting nodes having a core node and sensor pods'20179,155,134'Methods and apparatus for rapidly responsive heat control in plasma processing devices'20159,088,357'Imaging system for passive alignment of engines'20158,931,512'Gas delivery system and method of use thereof'20158,895,889'Methods and apparatus for rapidly responsive heat control in plasma processing devices'20148,616,043'Methods and apparatus for calibrating pressure gauges in a substrate processing system'20138,616,224'Methods and apparatus for providing a gas mixture to a pair of process chambers'20138,562,742'Apparatus for radial delivery of gas to a chamber and methods of use thereof'20138,231,799'Plasma reactor apparatus with multiple gas injection zones having time-changing separate configurable gas compositions for each zone'20128,074,677'Method and apparatus for controlling gas flow to a processing chamber'20118,048,806'Methods to avoid unstable plasma states during a process transition'20117,975,558'Method and apparatus for gas flow measurement'20117,910,013'Method of controlling a chamber based upon predetermined concurrent behavior of selected plasma parameters as a function of source power, bias power and chamber pressure'20117,901,952'Plasma reactor control by translating desired values of M plasma parameters to values of N chamber parameters'20117,846,497'Method and apparatus for controlling gas flow to a processing chamber'20107,795,153'Method of controlling a chamber based upon predetermined concurrent behavior of selected plasma parameters as a function of selected chamber parameters'20107,775,236'Method and apparatus for controlling gas flow to a processing chamber'20107,743,670'Method and apparatus for gas flow measurement'20107,540,971'Plasma etch process using polymerizing etch gases across a wafer surface and additional polymer managing or controlling gases in independently fed gas zones with time and spatial modulation of gas content'20097,541,292'Plasma etch process with separately fed carbon-lean and carbon-rich polymerizing etch gases in independent inner and outer gas injection zones'20097,470,626'Method of characterizing a chamber based upon concurrent behavior of selected plasma parameters as a function of source power, bias power and chamber pressure'20087,452,824'Method of characterizing a chamber based upon concurrent behavior of selected plasma parameters as a function of plural chamber parameters'20087,431,859'Plasma etch process using polymerizing etch gases with different etch and polymer-deposition rates in different radial gas injection zones with time modulation'2008Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2008–2017Patents assigned to APPLIED MATERIALS INC (22)· patent assignee history
2008–2017Based in Sunnyvale, CA, US· patent location history
2011–2015Patents assigned to GOLD EZRA ROBERT (7)· patent assignee history
2011–2013Patents assigned to LEE JARED AHMAD (4)· patent assignee history
2011–2012Patents assigned to GEOFFRION BRUNO (2)· patent assignee history
2013–2015Patents assigned to CRUSE JAMES P (5)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 22 | 2008–2017 |
| GOLD EZRA ROBERTself | 7 | 2011–2015 |
| CRUSE JAMES P | 5 | 2013–2015 |
| LEE JARED AHMAD | 4 | 2011–2013 |
| GEOFFRION BRUNO | 2 | 2011–2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Sunnyvale, California, US | 25 | 2008–2017 |